Chemically deposited alloy semiconductor thin films

Abstract

The chemical deposition method has been employed in the preparation of alloy semiconductor thin films. Thin films of Cd_1−xHg_xS and Cd_1−xPb_xS alloys were deposited onto titanium substrates from thiourea solutions. A monotonic decrease in the bandgaps of the semiconductor alloys was obtained as the Hg and Pb ratio was increased. Bandgap values of 1.8 and 1.6eV were measured for electrodes with a Hg: Cd ratio and a Pb: Cd ratio of 0.18 respectively, considerably lower than the bandgap of pure CdS.