In-situ investigation by X-ray diffraction and wafer curvature of phase formation and stress evolution during metal thin film – silicon reactions

Q2 Chemistry

Zeitschrift Fur Kristallographie Pub Date : 2007-11-01 DOI:10.1524/ZKRI.2007.2007.SUPPL_26.81

O. Thomas

引用次数: 0

查看原文本刊更多论文

利用x射线衍射和晶圆曲率对金属薄膜-硅反应相形成和应力演化进行了原位研究

本文章由计算机程序翻译，如有差异，请以英文原文为准。

求助全文

约1分钟内获得全文求助全文

来源期刊

Zeitschrift Fur Kristallographie 物理-晶体学

CiteScore

1.47

自引率

0.00%

发文量

审稿时长

3 months

期刊介绍： Zeitschrift für Kristallographie International journal for structural, physical, and chemical aspects of crystalline materials ISSN 0044-2968 Founded in 1877 by Paul Groth Zeitschrift für Kristallographie is one of the world’s oldest scientific journals. In original papers, letters and review articles it presents results of theoretical or experimental study on crystallography.