First-principles Study of Electronic and Magnetic Properties of Two-dimensional Hexagonal Boron Nitride Doped with Germanium and Tin Atoms

D. Adhikari, Jeewan Panthee, Saurabh Lamsal, K. Adhikari, N. Adhikari, Nurapathi Pantha
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Abstract

For the study of geometrical structure, stability, and electronic and magnetic properties of Germanium and tin-doped two-dimensional hexagonal boron nitride (h-BN), First-principles calculations have been carried out. Plane-wave pseudo-potential method in association with the density functional theory (DFT) framework used in Quantum ESPRESSO codes has been implemented to perform the calculations. A 3X3 supercell size substitutional doping of a single Boron or Nitrogen atom was carried out for the study. Pristine h-BN showed non-magnetic behavior with comprehensive gap material having an indirect band gap of 4.64eV. The doping effect of Ge and Sn atoms at the B-site was energetically more favorable than N-site. The defected h-BN sheet was found to be severely distorted with remarkable alteration in bond length and angles around the defected sites. Ge doped h-BN showed semiconducting properties with a reduced band gap in comparison to the insulating nature of pristine h-BN, whereas half metallicity was noticed in Sn doped h-BN system. Both the systems showed a magnetic moment of 1.0 µB.
掺杂锗和锡原子的二维六方氮化硼的电子和磁性能第一性原理研究
为了研究锗和锡掺杂二维六方氮化硼(h-BN)的几何结构、稳定性以及电子和磁性能,进行了第一性原理计算。采用平面波伪势法结合密度泛函理论(DFT)框架进行计算。采用3X3超级单体大小的单硼或单氮原子取代掺杂进行了研究。原始的h-BN具有非磁性,具有4.64eV的间接带隙。Ge和Sn原子在b位的掺杂效应比n位更有利。发现缺陷的h-BN片严重扭曲,缺陷位点周围的键长和角度发生了显著变化。与原始的h-BN相比,Ge掺杂的h-BN表现出半导体性质,带隙减小,而Sn掺杂的h-BN则表现出半金属性。两种体系的磁矩均为1.0µB。
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