The Effect of Al Doping on Structure and Optical Properties of ZnO Thin Films

S. Najim, A. M. Muhammed, A. Pogrebnjak
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Abstract

Aluminum doped zinc oxide thin films were synthesized by the chemical vapor deposition (CVD) on the glass substrate. The optical and structural properties of these films as a function of Al content (0,1,5,10 wt.%) were investigated. The average transmittance of all films is higher than 80% at a wide wavelength of 300-800nm. The bandgap energy, calculated for all samples with different Al dopant concentration, is around 3. 35-3.56eV. X-ray diffraction results reveal that A1/ZnO films have a hexagonal wurtzite structure with (002) preferred orientation. Top and cross-sectional scanning electron microscopy (SEM) micrographs of the prepared ZnO samples exhibit the crystalline growth structures by increasing Al concentration. Doping the ZnO with A$1^{3+}$ influences the volume composition of ZnO:A1 thin films, causes an increase in the surface roughness with an increase in the Al and O content, and a decrease in the average Zn concentration.
Al掺杂对ZnO薄膜结构和光学性能的影响
采用化学气相沉积(CVD)技术在玻璃衬底上合成了铝掺杂氧化锌薄膜。研究了铝含量(0、1、5、10 wt.%)对薄膜光学和结构性能的影响。在300-800nm宽波长范围内,所有薄膜的平均透过率均大于80%。对不同Al掺杂浓度的样品进行带隙能计算,带隙能在3左右。35 - 3.56 ev。x射线衍射结果表明,A1/ZnO薄膜具有(002)择优取向的六方纤锌矿结构。随着Al浓度的增加,ZnO样品的顶部和截面扫描电镜(SEM)显示出晶体生长结构。A$1^{3+}$掺杂ZnO会影响ZnO:A1薄膜的体积组成,导致表面粗糙度随着Al和O含量的增加而增加,平均Zn浓度降低。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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