Growth Temperature Dependence of Eu-Doped GaN Grown by Organometallic Vapor Phase Epitaxy

A. Nishikawa, T. Kawasaki, N. Furukawa, Y. Terai, Y. Fujiwara
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Abstract

We investigated the growth temperature dependence of luminescence properties in Eu-doped GaN layers grown by organometallic vapor phase epitaxy (OMVPE). The dominant photoluminescence (PL) peak intensity at 621 nm, due to the intra-4f shell transitions of 5D0-7F2 in Eu3+ ions, became the highest when the sample was grown at 1000°C. Above 1000°C, the PL peak intensity decreased because of the lower Eu concentration associated with the surface desorption of Eu ions. On the other hand, although the Eu concentration of the layer grown at 900°C was only half of the layer grown at 1000°C, the pronounced decline in the PL peak intensity was observed with decreasing growth temperature from 1000°C to 900°C, which results from the modification of the local structure around Eu ions. These results indicate that the growth temperature strongly influences the Eu concentration and the local structure around Eu ions. Therefore, an optimized growth temperature exists for strong Eu-related luminescence from Eu-doped GaN layer grown by OMVPE.
有机金属气相外延生长铕掺杂GaN的生长温度依赖性
研究了有机金属气相外延(OMVPE)生长的铕掺杂GaN层发光特性对生长温度的依赖性。当样品在1000℃下生长时,由于5D0-7F2在Eu3+离子中的4f层内跃迁,在621 nm处的优势光致发光(PL)峰值强度达到最高。在1000°C以上,由于Eu离子的表面脱附导致Eu浓度降低,PL峰强度下降。另一方面,虽然900°C生长层的Eu浓度仅为1000°C生长层的一半,但从1000°C到900°C,随着生长温度的降低,PL峰强度明显下降,这是由于Eu离子周围局部结构的修饰。这些结果表明,生长温度对Eu浓度和Eu离子周围的局部结构有很大的影响。因此,对于OMVPE生长的掺铕GaN层,存在一个较好的生长温度,可以产生较强的铕相关发光。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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