Photonic integration of plasmonic Magneto-optical waveguide and Si nanowire waveguide

Abstract

The fabrication technology of a low-propagation-loss plasmonic waveguide and the technology of the monolithical integration of a plasmonic and Si nanowire waveguides were established. It was found that both the out-of-plane confinement and the in-plane confinement are critically important in order to obtain a low propagation loss of a surface plasmon. Longdistance propagation of a surface plasmon on the surface of a ferromagnetic metal was demonstrated. A low propagation loss of 0.7 dB/μm for a surface plasmon in a Co/TiO2/SiO2 plasmonic structure on a Si substrate were achieved.