Nanostructured PVD film-coated alumina powders for thermal spraying technologies

Abstract

Technique and equipment of physical vapor deposition (PVD) thin films on ceramic powders for thermal spraying technologies are developed. Alumina powders coated metal thin films were used for plasma spraying. Deposition of two-layer films on the powder particles was carried out. The first layer was titanium and the second layer was aluminum or copper. The titanium as adhesively-active element capable of wet alumina is necessary for increase the adhesion strength vacuum films. Effect of PVD process conditions on the concentration of titanium, aluminum and copper ions in the metallic plasma flow was studied. Suggested are the relationships allowing determination of time, required to attain the preset temperature on the powder particle surface and to produce a metallic film of the required thickness.