Impact of Deposition Temperature on Amorphous Zinc Oxide Thin Film Characteristics

Abstract

In this paper, we discuss the deposition of amorphous zinc oxide (a: ZnO) thin film at two different temperatures by spray pyrolysis unit for Thin Film Transistor (TFT) application. The a: ZnO films were studied for its structural, morphology, composition, optical and electrical properties by means of XRD, SEM, EDAX, UV-Visible spectroscopy and I-V measurement system respectively. The film thickness characterized by optical Profilometer. The SEM images exhibit the variation in temperature leads to the crystallinity of the film. The XRD spectrum confirmed the films were amorphous in nature.