First Principle Defect Analysis in 150 µm 4H-SiC Epitaxial Layer Schottky Barrier Detectors

Joshua W. Kleppinger, S. Chaudhuri, Omerfaruk Karadavut, K. Mandal
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Abstract

High resolution Schottky barrier detectors (SBDs) were fabricated on 150 µm thick 4H-SiC epilayers using a proprietary device design. Electrical properties of the SBD junctions were characterized by temperature-dependent current-voltage (I-V- T) measurements which showed ultra-low leakage current densities lower than 100 pA cm−2at -150 V and remained below 1 µ A.cm−2 even at 600K. Electrically active deep levels present in the epilayers were identified and characterized by deep level transient spectroscopy (DLTS) which showed the presence of three deep levels - Ti(c), Z1/2 and EH6/7- with low concentrations (~1011 cm−3). The energy levels were investigated theoretically by density functional theory (DFT) calculations on intrinsic vacancies and titanium point defects. Pulse height spectra (PHS) were collected using a 241Am alpha source and a percentage energy resolution of 0.55% at 5486 keV was obtained. Further analysis of the forward bias I-V- T showed an improvement in ideality factor and barrier height at elevated temperature revealing the improvement of detection performance at higher temperature.
150µm 4H-SiC外延层肖特基势垒探测器的第一原理缺陷分析
采用专有器件设计,在150µm厚的4H-SiC薄膜上制备了高分辨率肖特基势垒探测器(sdd)。通过温度相关的电流-电压(I-V- T)测量表征了SBD结的电学特性,结果表明,在-150 V时,泄漏电流密度低于100 pA cm - 2,即使在600K时也保持在1µa cm - 2以下。利用深能级瞬态光谱(deep level transient spectroscopy, dts)对脱膜中存在的电活性能级进行了鉴定和表征,发现存在3个低浓度(~1011 cm−3)的深能级Ti(c)、Z1/2和EH6/7。利用密度泛函理论(DFT)计算了本征空位和钛点缺陷的能级。采用241Am α源采集了脉冲高度光谱(PHS),在5486 keV下获得了0.55%的百分比能量分辨率。进一步分析正向偏压I-V- T,发现理想因子和势垒高度在高温下有所提高,表明在高温下检测性能有所提高。
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