Si Nanopillar/SiGe Composite Structure for Thermally Managed Nano-devices

D. Ohori, M. Murata, A. Yamamoto, K. Endo, Min-Hui Chuang, Ming-Yi Lee, Yiming Li, J. Tarng, Yao-Jen Lee, S. Samukawa
{"title":"Si Nanopillar/SiGe Composite Structure for Thermally Managed Nano-devices","authors":"D. Ohori, M. Murata, A. Yamamoto, K. Endo, Min-Hui Chuang, Ming-Yi Lee, Yiming Li, J. Tarng, Yao-Jen Lee, S. Samukawa","doi":"10.1109/NANO51122.2021.9514289","DOIUrl":null,"url":null,"abstract":"We have demonstrated a thermally managed Si nanopillar/SiGe composite structure. Our fabricated defect-free Si nanopillar channel structure showed a 1/100 times lower thermal conductivity than Si bulk thanks to the control of the phonon transports. The results of thermal conductivity measurements clarified that the nanopillar structure could eliminate electron-phonon scattering. As such, this structure represents a promising solution for advanced CMOS technologies.","PeriodicalId":6791,"journal":{"name":"2021 IEEE 21st International Conference on Nanotechnology (NANO)","volume":"2015 1","pages":"199-202"},"PeriodicalIF":0.0000,"publicationDate":"2021-07-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2021 IEEE 21st International Conference on Nanotechnology (NANO)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/NANO51122.2021.9514289","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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Abstract

We have demonstrated a thermally managed Si nanopillar/SiGe composite structure. Our fabricated defect-free Si nanopillar channel structure showed a 1/100 times lower thermal conductivity than Si bulk thanks to the control of the phonon transports. The results of thermal conductivity measurements clarified that the nanopillar structure could eliminate electron-phonon scattering. As such, this structure represents a promising solution for advanced CMOS technologies.
用于热管理纳米器件的硅纳米柱/SiGe复合结构
我们已经展示了一种热管理的硅纳米柱/SiGe复合结构。由于控制了声子输运,我们制备的无缺陷硅纳米柱通道结构的导热系数比硅体低1/100。热导率测量结果表明,纳米柱结构可以消除电子-声子散射。因此,这种结构代表了先进CMOS技术的一个有前途的解决方案。
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