Effect of System Pressure on Liquid Film Behavior in Horizontal Annular Flow

Ning Zhao, Tian Zhang, Xianle Zang, Long Xu, Jing Wang
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Abstract

The measurement of liquid film parameters is of great significance in the momentum transfer and heat transfer characteristics of gas-liquid two-phase in annular flow. The liquid film at the bottom of the horizontal annular flow is the thickest and produces the greatest influence on the nature of the annular flow. In large diameter horizontal pipes, the effect of pressure on liquid film behavior lacks systematic discussion. Therefore, a dynamic measurement system for annular flow liquid film was designed based on near-infrared(NIR) sensing technology to complete the measurement of annular flow liquid film thickness data under five pressures. The average liquid film thickness at the bottom is obtained by variational modal decomposition(VMD) of the time series signal, and the wave velocity parameter is obtained by mutual correlation velocimetry. The article initially discusses the effect of pressure on the average thickness of the bottom liquid film as well as the interfacial wave velocity.
系统压力对水平环空流动液膜特性的影响
液膜参数的测量对气液两相环空流动的动量传递和传热特性具有重要意义。水平环空流动底部液膜最厚,对环空流动性质的影响最大。在大直径水平管道中,压力对液膜行为的影响缺乏系统的讨论。为此,设计了基于近红外(NIR)传感技术的环空液膜动态测量系统,完成五种压力下环空液膜厚度数据的测量。通过时间序列信号的变分模态分解(VMD)得到底部平均液膜厚度,通过互相关测速法得到波速参数。本文初步讨论了压力对底液膜平均厚度和界面波速的影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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