Application of X-rays to Interpret Intensity Ratios for Nickel in Nickel (II) Oxide

IF 0.5 4区 物理与天体物理 Q4 PHYSICS, MULTIDISCIPLINARY
O. K. Köksal, Ö. Söğüt, E. Küçükönder, S. Dagli
{"title":"Application of X-rays to Interpret Intensity Ratios for Nickel in Nickel (II) Oxide","authors":"O. K. Köksal, Ö. Söğüt, E. Küçükönder, S. Dagli","doi":"10.12693/aphyspola.143.362","DOIUrl":null,"url":null,"abstract":"The K -shell characteristic X-ray intensity ratios of nickel (II) oxide thin films generated by chemical spraying with 1–6 percent boron doping were studied. An americium-241 radioisotope source generated 59.543 kilo-electron volt gamma rays at 50 mili Curie intensity for these samples. The distinctive X-rays of the samples were calculated using a Canberra ultra-low energy germanium detector (with a resolution of 150 electron volts at 5.96 keV). The results were interpreted based on the amount of boron doped in nickel (II) oxide thin films, and it was discovered that, with the exception of boron doping quantities of 5 percent and 6 percent, K -shell X-ray intensity ratios rose as boron doping amounts increased. The findings are given and compared to those of the previous study. The obtained results are provided and compared in the table to the other researchers’ theoretical and experimental results","PeriodicalId":7164,"journal":{"name":"Acta Physica Polonica A","volume":"50 6","pages":""},"PeriodicalIF":0.5000,"publicationDate":"2023-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Acta Physica Polonica A","FirstCategoryId":"101","ListUrlMain":"https://doi.org/10.12693/aphyspola.143.362","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"PHYSICS, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0

Abstract

The K -shell characteristic X-ray intensity ratios of nickel (II) oxide thin films generated by chemical spraying with 1–6 percent boron doping were studied. An americium-241 radioisotope source generated 59.543 kilo-electron volt gamma rays at 50 mili Curie intensity for these samples. The distinctive X-rays of the samples were calculated using a Canberra ultra-low energy germanium detector (with a resolution of 150 electron volts at 5.96 keV). The results were interpreted based on the amount of boron doped in nickel (II) oxide thin films, and it was discovered that, with the exception of boron doping quantities of 5 percent and 6 percent, K -shell X-ray intensity ratios rose as boron doping amounts increased. The findings are given and compared to those of the previous study. The obtained results are provided and compared in the table to the other researchers’ theoretical and experimental results
应用x射线解释镍(II)氧化物中镍的强度比
研究了1 ~ 6%硼掺杂化学喷涂制备的氧化镍薄膜的K壳特征x射线强度比。在这些样品中,镅-241放射性同位素源产生了59.543千电子伏特的50毫居里强度的伽马射线。使用堪培拉超低能锗探测器(分辨率为150电子伏特,5.96 keV)计算样品的独特x射线。结果基于镍(II)氧化物薄膜中硼掺杂量的解释,发现除了硼掺杂量为5%和6%外,K -壳层x射线强度比随着硼掺杂量的增加而增加。给出了研究结果,并与之前的研究结果进行了比较。所获得的结果在表格中提供并与其他研究人员的理论和实验结果进行了比较
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
Acta Physica Polonica A
Acta Physica Polonica A 物理-物理:综合
CiteScore
1.50
自引率
0.00%
发文量
141
审稿时长
6 months
期刊介绍: Contributions which report original research results and reviews in the fields of General Physics, Atomic and Molecular Physics, Optics and Quantum Optics, Quantum Information, Biophysics, Condensed Matter, and Applied Physics are welcomed.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信