Modification on near-surface precipitation in AlGE alloy by ion irradiation

K.L. Kusbridge
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引用次数: 8

Abstract

A model including precipitate dissolution and solute segregation is used to explain the changes in precipitate distribution during 100 keV Al+ ion irradiation of AlGe alloy. It is found by TEM that Ge precipitates in the peak damage region i.e. <100 nm from the surface are destroyed by prolonged irradiation to doses greater than 28 dpa, whereas precipitates near the tail of the damage profile i.e. 100–250 nm from the surface, continue to grow. SIMS has shown that the dissolution of near-surface precipitates is accompanied by segregation of Ge to depths below the damage peak, indicating that Ge segregates down defect gradients.

The results show that solute segregation is an important factor in determining precipitate stability. It is thought that the reversal in precipitate behaviour from growth to dissolution occurs because the solute depletion in the matrix near the surface reduces the solute arrival rate at the precipitate sufficiently for recoil dissolution to determine the precipitate behaviour. A preliminary study on low temperature irradiation of AlGe shows that Ge solute re-distribution rate is limited by the concentration and mobility of vacancy-solute complexes, and not by the rate of precipitate dissolution.

铝近表面沉淀的改性离子辐照GE合金
用包括沉淀溶解和溶质偏析的模型解释了100keV Al+离子辐照Al过程中沉淀分布的变化锗合金。TEM发现Ge在峰值损伤区即<;距离表面100 nm的辐射剂量大于28 dpa时会被破坏,而损伤轮廓尾部附近的沉淀物(即距离表面100–250 nm)会继续生长。SIMS表明,近表面沉淀物的溶解伴随着Ge偏析到损伤峰以下的深度,表明Ge沿缺陷梯度偏析。结果表明,溶质偏析是决定沉淀稳定性的重要因素。据认为,沉淀物行为从生长到溶解发生逆转,是因为表面附近基质中的溶质贫化降低了溶质到达沉淀物的速率,足以使反冲溶解来确定沉淀物行为。铝低温辐照的初步研究Ge表明,Ge的溶质再分布速率受空位-溶质络合物的浓度和迁移率的限制,而不受沉淀溶解速率的限制。
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