Non-selective oxidation of ZrAl3

M. Paljević
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引用次数: 11

Abstract

The oxidation of ZrAl3 in dry oxygen in the temperature range 865–1073 K obeys a logarithmic rate law in the first period of reaction. An activation energy of 214 kJ mol−1 has been estimated. Some time after this first period, depending on the temperature, the protective oxide film transforms to a porous one and the reaction rate increases. The oxide layer consists of α-Al2O3, tetragonal ZrO2 and small amounts of monoclinic ZrO2, in contrast to the ZrO2 oxide layer formed during oxidation of other phases in the Zr-Al system, where the selective oxidation of zirconium takes place.

ZrAl3的非选择性氧化
在865–1073K的温度范围内,ZrAl3在干氧中的氧化在反应的第一阶段遵循对数速率定律。估计活化能为214 kJ mol−1。在第一段时间后的一段时间内,根据温度的不同,保护性氧化膜转变为多孔氧化膜,反应速率增加。氧化层由α-Al2O3、四方ZrO2和少量单斜ZrO2组成,与Zr-Al系统中其他相氧化过程中形成的ZrO2氧化层不同,在Zr-Al体系中,锆发生选择性氧化。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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