Automation and Application of a Direct-Current Plasma Emission Spectrometer

Abstract

The direct-current plasma (DCP) coupled to an echelle spectrometer has been used for over 6 years in our laboratory as one of several independent methods for the certification of Standard Reference Materials (SRMs). The demanding certification process requires maximum performance from an analytical method as well as a good understanding of the method capabilities and limitations. We have made a number of modifications to the conventional DCP spectrometer to improve accuracy, precision, and analysis speed. Figure I is a schematic diagram of the entire DCP spectrometric system with all modifications and enhancements. This paper discusses these modifications and their application to a number of analytical problems.