Depth Profiling of Trace Constituents Using Secondary Ion Mass Spectrometry

C. Magee
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引用次数: 1

Abstract

[l] Powell, C. J., Aust. J. Phys. 35. 769 (1982). [2] Powell, C. J., Appl. Surf Sci. 4, 492 (1980). [3] Powell, C. J., J. Vac. Sci. Tech. A 4, 1532 (1986). f4J Bishop, H. E., Chornik, B., Le Gressus, C_. and Le Moe]. A., Surf. Interface Anal. 6, 116 (1984). (5] Doern, F. E., Kover, L., and McIntyre, N. S., Surf Interface Anal. 6, 282 (1984). (61 Powell, C. J., Erickson, N. E., and Madey. T. E., J. Electron. Spectrosc. 17, 361 (1979). [7] Seah, M. P., Jones, M. E., and Anthony, M. T., Surf. lIterface Anal. 6, 242 (1984). [8] Erickson, N. E., and Powell, C. J., Surf Interface Anal. 9. III (1986). [9] Seah, M. P., Surf Interface Anal. 9, 85 (1986). [to] Tanuma, S., Powell, C. J., and Penn, D. R.. Surf Sci. (in press). [11] Powell, C. J., Electronic Materials and Processes. edited by N. H. Kordsmeier, C. A. Harper, and S. M. Lee, Society for the Advancement of Material and Process Engineering, Covina, CA (1987), p. 252. [12] Powell, C. J., Surf. Interface Anal. (in press). Depth Profiling of Trace Constituents Using Secondary Ion Mass Spectrometry
利用二次离子质谱法对痕量成分进行深度分析
[l] 鲍威尔,C.J.,澳大利亚。J.Phys。35.769(1982)。[2] Powell,C.J.,Appl。冲浪科学。4492(1980)。[3] Powell,C.J.,J.Vac。科学。Tech.A41532(1986)。f4J Bishop,H.E.,Chornik,B.,Le Gressus,C_。和Le Moe]。A.冲浪。接口分析。61116(1984)中描述的。(5)Doern,F.E.,Kover,L.和McIntyre,N.S.,《冲浪界面分析》第6期,第282页(1984年)。(61Powell,C.J.,Erickson,N.E.和Madey.TE.,J.Electron.Spectrosc.17361(1979)。[7] Seah,M.P.,Jones,M.E.和Anthony,M.T.,Surf。l表面分析。6242(1984)中描述。[8] Erickson,N.E.和Powell,C.J.,冲浪界面分析。9.III(1986)。[9] Seah,M.P.,《表面界面分析》。9,85(1986)。[致]Tanuma,S.、Powell,C.J.和Penn,D.R.冲浪科学。(印刷中)。[11] Powell,C.J.,电子材料与工艺。由N.H.Kordsmeier、C.A.Harper和S.M.Lee编辑,材料与工艺工程进步学会,加利福尼亚州科维纳(1987),第252页。[12] 鲍威尔,C.J.,冲浪。接口分析。(印刷中)。二次离子质谱法测定微量成分的深度
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