Accuracy in Microanalysis by Electron Energy-Loss Spectroscopy

R. Egerton
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引用次数: 2

Abstract

[I] Williams, D. B., Practical Analytical Electron Microscopy in Materials Science, Philips Electron Optics Publishing Group, Mahwah, NJ (1984). [2] Joy, D. c., Romig, A. D., and Goldstein, 1. I., Principles of Analytical Electron Microscopy, Plenum Press, New York (1986). [3] Goldstein, J. I., Newbury, D. E., Echlin, P., Joy, D. C., Fiori, C. E., and Lifshin, E., Scanning Electron Microscopy and X-ray Microanalysis, Plenum Press, New York (1981) p. 435. [4] Liebhafshy, H. A., Pfeiffer, H. G., and Zemany, P. D., X-ray Microscopy and X-ray Microanalysis, Elsevier/ North Holland, Amsterdam (1960) p. 321. [5] Cliff, G., and Lorimer, G. W., J. Microsc. (U.K.) 103, 203 (1975). [6] Michael, J. R., M.S. Thesis, Lehigh University (1981) p.41. [7] Romig, A. D., and Goldstein, J. I., Detectability Limits and Spatial Resolution in STEM X-ray Analysis: Application to Fe-Ni Alloys, Microbeam Analysis1979, San Francisco Press (1979) p. 124. [8] Lyman, C. E., Microanalysis Limits on the Use of Energy Dispersive X-ray Spectroscopy in the Analytical Electron Microscope, Microbeam Analysis-1986, San Francisco Press (1986) p. 434. [9] Lyman, C. E., and Michael, J. R., A Sensitivity Test for Energy Dispersive X-ray Spectrometry in the Analytical Electron Microscope, Analytical Electron Microscopy1987, San Francisco Press (1987) in press. rIO] Williams, D. B., Towards the Limits of Microanalysis in the Analytical Electron Microscope, Electron Microscopy and Analysis-1987, The Institute of Physics (1987) in press. [II] Ziebold, T. 0., Anal. Chern. 36, 322 (1967). [121 Williams, D. B., Standardized Definitions of X-ray Analysis Performance Criteria in the AEM, Microbeam Analysis-1986, San Francisco Press (1986) p. 443. [13] Williams, D. B., and Steel, E. B., A Standard Cr Thin Film Specimen to Measure the X-ray Peak to Background Ratio (Using the Fiori Definition) in Analytical Electron Microscopes, Analytical Electron Microscopy-1987, San Francisco Press (1987) in press. [14] Fiori, C. E., Swyt, C. R., arid Ellis, J. R., The Theoretical Characteristic to Continuum Ratio in Energy Dispersive Analysis in the Analytical Electron Microscope, Microbeam Analysis-1982, San Francisco Press (1982) p. 57. [IS] Vale, S. H., and Statham, P. J., STEM Image Stabilization for High Resolution Microanalysis, Proc. XIth Int. Congo on Electron Microscopy, Kyoto 1986, Japanese Society of Electron Microscopy, Tokyo (1986) p. 573.
电子能量损失谱在微量分析中的准确性
[I] Williams,D.B.,《材料科学中的实用分析电子显微镜》,飞利浦电子光学出版集团,新泽西州马赫瓦(1984)。[2] Joy,D.c.,Romig,A.D.和Goldstein,1。I.,《分析电子显微镜原理》,Plenum出版社,纽约(1986)。[3] Goldstein,J.I.、Newbury,D.E.、Echlin,P.、Joy,D.C.、Fiori,C.E.和Lifshin,E.,《扫描电子显微镜和X射线显微分析》,Plenum出版社,纽约(1981),第435页。[4] Liebhafshy,H.A.、Pfeiffer,H.G.和Zemany,P.D.,X射线显微镜和X射线微分析,爱思唯尔/北荷兰,阿姆斯特丹(1960),第321页。[5] Cliff,G.和Lorimer,G.W.,J.Microsc。(英国)103203(1975)。[6] 迈克尔,J.R.,理学硕士论文,利哈伊大学(1981年),第41页。[7] Romig,A.D.和Goldstein,J.I.,STEM X射线分析中的可检测极限和空间分辨率:Fe-Ni合金的应用,微束分析1979,旧金山出版社(1979),第124页。[8] Lyman,C.E.,《分析电子显微镜中使用能量分散X射线光谱的微量分析限制》,微束分析-1986,旧金山出版社(1986)第434页。[9] Lyman,C.E.和Michael,J.R.,分析电子显微镜中能量分散X射线光谱法的灵敏度测试,分析电子显微术1987,旧金山出版社(1987)。威廉姆斯,D.B.,《分析电子显微镜中微量分析的极限》,电子显微镜和分析-1987,物理研究所(1987),出版。[II] Ziebold,T.0.,分析。Chern。36322(1967)。[121 Williams,D.B.,AEM中X射线分析性能标准的标准化定义,微束分析-1986,旧金山出版社(1986),第443页。[13] Williams,D.B.和Steel,E.B.,在分析电子显微镜中测量X射线峰背景比的标准Cr薄膜样品(使用Fiori定义),分析电子显微镜-1987,旧金山出版社(1987)出版。[14] Fiori,C.E.,Swyt,C.R.,and Ellis,J.R.,分析电子显微镜中能量分散分析的理论特征与连续统比,微束分析-1982,旧金山出版社(1982),第57页。[IS]Vale,S.H.和Statham,P.J.,用于高分辨率微分析的STEM图像稳定,Proc。XIth Int.刚果电子显微镜,1986年京都,日本电子显微镜学会,东京(1986),第573页。
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