Influence of Deposition Temperature on the Electrical and Electrochemical Properties of Carbon-Based Coatings for Metallic Bipolar Plates, Prepared by Cathodic Arc Evaporation

Maximilian Steinhorst, Maurizio Giorgio, T. Roch, C. Leyens
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Abstract

Cathodic arc evaporation is a well-established physical vapor deposition technique which is characterized by a high degree of ionization and high deposition rate. So far, this technique has been mainly used for the deposition of tribological coatings. In this study, anti-corrosive and electrical conductive carbon-based coatings with a metallic interlayer were prepared on stainless steel substrates as surface modification for metallic bipolar plates. Hereby, the influence of the deposition temperature during the deposition of the carbon top layer was investigated. Raman spectroscopy revealed differences in the microstructure at 200˚C compared to 300˚C and 100˚C. Measurements of the interfacial contact resistance showed that the deposited coatings significantly improve the electrical conductivity. There are only minor differences between the different carbon top layers. The corrosion resistance of the coatings was studied via potentiodynamic polarization at room temperature and 80˚C. Experiments showed that the coating with a carbon top layer deposited at 200˚C, considerably reduces the current density and thus corrosion of the substrate is suppressed.
沉积温度对阴极电弧蒸发法制备金属双极板碳基涂层电学和电化学性能的影响
阴极电弧蒸发是一种成熟的物理气相沉积技术,具有高电离度和高沉积速率的特点。到目前为止,该技术主要用于摩擦学涂层的沉积。本研究在不锈钢基体上制备了具有金属中间层的耐腐蚀导电碳基涂层,作为金属双极板的表面改性材料。因此,研究了沉积温度对碳顶层沉积过程的影响。拉曼光谱显示,在200℃时,微观结构与300℃和100℃时不同。界面接触电阻的测量表明,沉积的涂层显著提高了导电性能。不同的碳层之间只有微小的差别。采用动电位极化法研究了涂层在室温和80℃下的耐蚀性。实验表明,在温度为200℃时沉积一层碳涂层,可以显著降低电流密度,从而抑制基体的腐蚀。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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