Study on controlled refractive index of optical thin films by PECVD

Q4 Physics and Astronomy

光学技术 Pub Date : 2014-01-01 DOI:10.3788/GXJS20144004.0353

薛. X. Jun, 杭凌侠 Hang Lingxia, 刘昊轩 Liu Haoxuan

引用次数: 1

Abstract

The graded-index optical films prepared by PECVD have some distinctive advantages when compared with others.By controlling reaction gases ratios,the relationship between different reaction gases ratios and refractive index、extinction coefficient、deposition rate of thin film is analyzed,the reasons for variation of refractive index、extinction coefficient and deposition rate of thin film are discussed,the refractive-index-controllable thin films,like SiOxFy、SiOxNy、SixNyare obtained,the refractive index range is 1.36~2.06.

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PECVD控制光学薄膜折射率的研究

PECVD制备的梯度折射率光学薄膜具有明显的优越性。通过控制反应气体比，分析了不同反应气体比与薄膜折射率、消光系数、沉积速率之间的关系，讨论了薄膜折射率、消光系数和沉积速率变化的原因，得到了折射率可控的SiOxFy、SiOxNy、sixnyy薄膜，其折射率范围为1.36~2.06。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

光学技术 Physics and Astronomy-Atomic and Molecular Physics, and Optics

CiteScore

0.60

自引率

0.00%

发文量

6699

期刊介绍： The predecessor of Optical Technology was Optical Technology, which was founded in 1975. At that time, the Fifth Ministry of Machine Building entrusted the School of Optoelectronics of Beijing Institute of Technology to publish the journal, and it was officially approved by the State Administration of Press, Publication, Radio, Film and Television for external distribution. From 1975 to 1979, the magazine was named Optical Technology, a quarterly with 4 issues per year; from 1980 to the present, the magazine is named Optical Technology, a bimonthly with 6 issues per year, published on the 20th of odd months. The publication policy is: to serve the national economic construction, implement the development of the national economy, serve production and scientific research, and implement the publication policy of "letting a hundred flowers bloom and a hundred schools of thought contend".