Material removal model of magnetorheological finishing based on dense granular flow theory

Abstract

Magnetorheological finishing (MRF) technology is widely used in the fabrication of high-precision optical elements. The material removal mechanism of MRF has not been fully understood because MRF technology involves the integration of electromagnetics, contact mechanics, and materials science. In this study, the rheological properties of the MR polishing fluid in oscillation model have been investigated. We propose that the shear-thinned MR polishing fluid over the polishing area should be considered a dense granular flow, based on which a new contact model of MRF over the polishing area has been constructed. Removal function and processing force test experiments were conducted under different working gaps. The normal pressure and effective friction equations over the polishing area were built based on the continuous medium and dense granular flow theories. Then, a novel MRF material removal model was established. A comparison of the results of the theoretical model with actual polishing results demonstrated the accuracy of the established model. The novel model proposed herein reveals the generation mechanism of shear force over a polished workpiece and realizes effective decoupling of the main processing parameters that influence the material removal of MRF. The results of this study will provide new and effective theoretical guidance for the process optimization and technology improvement of MRF.