Effect of different annealing conditions on the properties of CdS thin films deposited by magnetron sputtering

IF 0.6 4区 物理与天体物理 Q4 OPTICS
Z. Chuan
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引用次数: 1

Abstract

CdS thin films were deposited on the substrate at temperature of 300 ℃ by magnetron sputtering. The deposited films were annealed at temperature of 370℃,380 ℃ and 390 ℃,respectively,in either atmosphere of dry air or a mixture of CdCl2and dry air. The morphology,structure and optical properties before and after thermal annealing were investigated. The results show that for samples annealed in dry air,the variations of grain size,surface roughness and visible light transmittance with annealing temperature are not obvious,while the optical band gap increases with temperature increasing. Annealed in the mixture of CdCl2and dry air,recrystallization and grain growth in the samples are significant. Surface roughness increases with temperature increasing,on the contrary,visible light transmittance and optical band gap decreases. These phenomena are the results of changes in the temperature of recrystallization and doping concentration in the band tail states at different annealing atmosphere.
不同退火条件对磁控溅射沉积CdS薄膜性能的影响
在300℃的温度下,采用磁控溅射法制备了CdS薄膜。分别在370℃、380℃和390℃的干燥空气气氛和cdcl2与干燥空气的混合气氛中对沉积膜进行退火。研究了热退火前后的形貌、结构和光学性能。结果表明:在干燥空气中退火的样品,晶粒尺寸、表面粗糙度和可见光透过率随退火温度的变化不明显,而光学带隙随温度的升高而增大;在cdcl2和干燥空气混合中退火后,样品的再结晶和晶粒长大明显。表面粗糙度随温度升高而增大,可见光透过率和光带隙减小。这些现象是不同退火气氛下带尾态再结晶温度和掺杂浓度变化的结果。
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来源期刊
CiteScore
1.20
自引率
14.30%
发文量
4258
审稿时长
2.9 months
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