Estimates of EEPROM Device Lifetime

IF 5.2 1区 计算机科学 Q1 COMPUTER SCIENCE, INFORMATION SYSTEMS
Leilei Li (李蕾蕾) , Zongguang Yu (于宗光) , Yue Hao (郝 跃)
{"title":"Estimates of EEPROM Device Lifetime","authors":"Leilei Li (李蕾蕾) ,&nbsp;Zongguang Yu (于宗光) ,&nbsp;Yue Hao (郝 跃)","doi":"10.1016/S1007-0214(11)70026-8","DOIUrl":null,"url":null,"abstract":"<div><p>A method was developed to estimate EEPROM device life based on the consistency for breakdown charge, <em>Q</em><sub>BD</sub>, for constant voltage time dependent dielectric breakdown (TDDB) and constant current TDDB stress tests. Although an EEPROM works with a constant voltage, <em>Q</em><sub>BD</sub> for the tunnel oxide can be extracted using a constant current TDDB. Once the charge through the tunnel oxide, Δ<em>Q</em><sub>FG</sub>, is measured, the lower limit of the EEPROM life can be related to <em>Q</em><sub>BD</sub>/Δ<em>Q</em><sub>FG</sub>. The method is reached by erase/write cycle tests on an EEPROM.</p></div>","PeriodicalId":60306,"journal":{"name":"Tsinghua Science and Technology","volume":null,"pages":null},"PeriodicalIF":5.2000,"publicationDate":"2011-04-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/S1007-0214(11)70026-8","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Tsinghua Science and Technology","FirstCategoryId":"1093","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S1007021411700268","RegionNum":1,"RegionCategory":"计算机科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"COMPUTER SCIENCE, INFORMATION SYSTEMS","Score":null,"Total":0}
引用次数: 0

Abstract

A method was developed to estimate EEPROM device life based on the consistency for breakdown charge, QBD, for constant voltage time dependent dielectric breakdown (TDDB) and constant current TDDB stress tests. Although an EEPROM works with a constant voltage, QBD for the tunnel oxide can be extracted using a constant current TDDB. Once the charge through the tunnel oxide, ΔQFG, is measured, the lower limit of the EEPROM life can be related to QBDQFG. The method is reached by erase/write cycle tests on an EEPROM.

EEPROM设备寿命估计
提出了一种基于击穿电荷(QBD)、恒压时间相关介质击穿(TDDB)和恒流TDDB应力测试一致性来估计EEPROM器件寿命的方法。虽然EEPROM工作在恒定电压下,但隧道氧化物的QBD可以使用恒定电流TDDB提取。一旦测量了通过隧道氧化物ΔQFG的电荷,EEPROM寿命的下限可以与QBD/ΔQFG相关。该方法通过在EEPROM上进行擦除/写周期测试来实现。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
CiteScore
12.10
自引率
0.00%
发文量
2340
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