USE OF PULSE UV TECHNOLOGIES FOR PROVIDING MICROBIOLOGICAL CLEANNES DURING PREPARATION FOR MISSIONS THAT NEED TO COMPLY WITH THE PLANETARY PROTECTION REQUIREMENTS
Е.А. Deshevaya, S. V. Fialkina, А.А. Guridov, S. G. Shashkovsky, S. Kireev, N. Khamidullina, D. Zakharenko
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引用次数: 0
Abstract
High-intensity UV flows can be used for deep decontamination of irregular shaped open surfaces of automatic spacecrafts. Procedures and conditions for elimination of UV-tolerant spore bacteria from different materials (polymers, photosensitive matrixes, semiconductors, metals etc.) were defined experimentally. Level of surface contamination that can be eliminated completely by xenon UV light source UIKb-01 Alfa was established.