Electrostatic Control and Air Ionization in Cleanrooms for Semiconductor and TFT Production

Q4 Engineering
G. Wei
{"title":"Electrostatic Control and Air Ionization in Cleanrooms for Semiconductor and TFT Production","authors":"G. Wei","doi":"10.17764/JIET.52.1.R38467496M5674P3","DOIUrl":null,"url":null,"abstract":"The most critical manufacturing processes for integrated circuits and thin-film transistors, mainstays of the semiconductor industry, take place in cleanrooms. The strictly controlled temperature and humidity in cleanrooms enable electrostatic charges to be generated and maintained on the surface of objects for an extended time. Electrostatic charge and discharge cause particle contamination, damage to products, and electromagnetic interference, which can lead to production tool lockup. With the development of new manufacturing technologies, products are becoming more sensitive to electrostatic discharge. How to control electrostatic charge and eliminate associated problems has become a challenge in the high-tech semiconductor industry.","PeriodicalId":35935,"journal":{"name":"Journal of the IEST","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2009-04-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of the IEST","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.17764/JIET.52.1.R38467496M5674P3","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"Engineering","Score":null,"Total":0}
引用次数: 4

Abstract

The most critical manufacturing processes for integrated circuits and thin-film transistors, mainstays of the semiconductor industry, take place in cleanrooms. The strictly controlled temperature and humidity in cleanrooms enable electrostatic charges to be generated and maintained on the surface of objects for an extended time. Electrostatic charge and discharge cause particle contamination, damage to products, and electromagnetic interference, which can lead to production tool lockup. With the development of new manufacturing technologies, products are becoming more sensitive to electrostatic discharge. How to control electrostatic charge and eliminate associated problems has become a challenge in the high-tech semiconductor industry.
半导体和TFT生产中洁净室的静电控制和空气电离
集成电路和薄膜晶体管(半导体工业的支柱)最关键的制造过程都是在洁净室中进行的。洁净室严格控制温度和湿度,可使物体表面产生并长时间保持静电荷。静电充放电会造成颗粒污染,损坏产品,产生电磁干扰,导致生产工具锁死。随着新制造技术的发展,产品对静电放电越来越敏感。如何控制静电电荷并消除相关问题已成为高科技半导体产业面临的挑战。
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来源期刊
Journal of the IEST
Journal of the IEST Engineering-Safety, Risk, Reliability and Quality
CiteScore
0.40
自引率
0.00%
发文量
0
期刊介绍: The Journal of the IEST is an official publication of the Institute of Environmental Sciences and Technology and is of archival quality and noncommercial in nature. It was established to advance knowledge through technical articles selected by peer review, and has been published for over 50 years as a benefit to IEST members and the technical community at large as as a permanent record of progress in the science and technology of the environmental sciences
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