Identification of Self-Buffer Layer on GaN/glass Films Grown by Reactive Sputtering

IF 1.5 4区 材料科学 Q4 MATERIALS SCIENCE, MULTIDISCIPLINARY
R. S. D. Oliveira, H. A. Folli, I. Horta, B. Damasceno, J. H. C. Augstrose, W. Miyakawa, A. Pereira, M. Massi, A. S. Silva Sobrinho, D. Leite
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引用次数: 0

Abstract

This work reports on the properties of GaN films grown by reactive magnetron sputtering onto glass substrate kept at relatively low temperature (400°C), using different RF power applied to the Ga target. Their structural, morphological, vibrational and optical properties were characterized by X-ray diffraction, atomic force and scanning electron microscopies, Raman spectroscopy and UV-vis spectrophotometry. The films have wurtzite phase with strong preferential orientation in the c -axis direction. Moreover, two clear contributions to the (0002) diffraction peak could be found, indicating the presence of two different morphologies, which were discussed in terms of the formation of an intermediate layer between the substrate and a dominating columnar-like microstructured film.
反应溅射生长GaN/玻璃薄膜上自缓冲层的鉴定
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来源期刊
Materials Research-ibero-american Journal of Materials
Materials Research-ibero-american Journal of Materials MATERIALS SCIENCE, MULTIDISCIPLINARY-
CiteScore
2.40
自引率
11.80%
发文量
161
审稿时长
3 months
期刊介绍: Information not localized
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