Furnace Annealing Behavior of B-doped Poly-SiGe Formed on Insulating Film

Q4 Engineering

Research Reports on Information Science and Electrical Engineering of Kyushu University Pub Date : 2003-09-26 DOI:10.15017/1515848

I. Tsunoda, T. Sadoh, M. Miyao

引用次数: 0

查看原文本刊更多论文

在绝缘膜上形成掺杂b的聚sige的炉内退火行为

本文章由计算机程序翻译，如有差异，请以英文原文为准。

求助全文

约1分钟内获得全文求助全文

来源期刊

Research Reports on Information Science and Electrical Engineering of Kyushu University Engineering-Electrical and Electronic Engineering

CiteScore

0.20

自引率

0.00%

发文量

期刊介绍： Research Reports on Information Science and Electrical Engineering of Kyushu University provides quick publication in English or in Japanese on the most recent findings and achievements in the Faculty of Information Science and Electrical Engineering, Kyushu University.