Pitting Corrosion of Ni3(Si,Ti) Intermetallic Compound at Various Chloride Concentrations

G. Priyotomo, P. Sebleku, Y. Kaneno
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引用次数: 2

Abstract

The pitting corrosion of Ni 3 (Si,Ti) with 4 at% Al consisting of two regions of a Ni 3 (Si,Ti) single-phase of L1 2 structure and two phases of L1 2 and fcc Ni ss was investigated as function of chloride concentrations by using electrochemical method, scanning electron microscope and energy dispersive X-Ray spectroscopy in neutral sodium chloride solutions at 293 K.  In addition, the pitting corrosion of Ni 3 (Si,Ti) and  type C276 alloy were also studied under the same experimental condition for comparison.  The pitting potential obtained for the Ni 3 (Si,Ti) with 4 at%Al decreased with increasing chloride concentration.  The specific pitting potential and pitting potential of Ni 3 (Si,Ti) with 4at%, Ni 3 (Si,Ti) and C276 were the lowest, the moderate and the highest, respectively, which means that the pitting corrosion resistance of Ni 3 (Si,Ti) was higher than Ni 3 (Si,Ti) with 4at% Al, but lower than that of C276.  A critical chloride concentration of Ni 3 (Si,Ti) with 4at% Al was found to be lower than that of Ni 3 (Si,Ti).  The Pitting corrosion of Ni 3 (Si,Ti) with 4at% Al occurred in the two phase mixture (L1 2 + Ni ss ).
不同氯化物浓度下Ni3(Si,Ti)金属间化合物的点蚀
采用电化学方法、扫描电镜和能量色散x射线能谱研究了含4 at% Al的Ni 3 (Si,Ti)在293 K中性氯化钠溶液中由L1 - 2单相和L1 - 2 - fcc - Ni - s两相组成的Ni 3 (Si,Ti)点蚀与氯离子浓度的关系。此外,在相同的实验条件下,对Ni 3 (Si,Ti)和C276型合金的点蚀进行了比较研究。在%Al下,含4的Ni 3 (Si,Ti)的点蚀电位随氯化物浓度的增加而降低。Ni 3 (Si,Ti)与Ni 3 (Si,Ti)、Ni 3 (Si,Ti)和C276的比点蚀电位和点蚀电位分别最低、中等和最高,说明Ni 3 (Si,Ti)的抗点蚀性高于Ni 3 (Si,Ti)与C276的抗点蚀性。发现含4% Al的Ni 3 (Si,Ti)的临界氯化物浓度低于Ni 3 (Si,Ti)的临界氯化物浓度。Ni 3 (Si,Ti)与4at% Al的点蚀发生在两相混合物(L1 2 + Ni ss)中。
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