Monitoring wafers’ geometric quality using an additive Gaussian process model

Linmiao Zhang, Kaibo Wang, Nan Chen
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引用次数: 35

Abstract

ABSTRACT The geometric quality of a wafer is an important quality characteristic in the semiconductor industry. However, it is difficult to monitor this characteristic during the manufacturing process due to the challenges created by the complexity of the data structure. In this article, we propose an Additive Gaussian Process (AGP) model to approximate a standard geometric profile of a wafer while quantifying the deviations from the standard when a manufacturing process is in an in-control state. Based on the AGP model, two statistical tests are developed to determine whether or not a newly produced wafer is conforming. We have conducted extensive numerical simulations and real case studies, the results of which indicate that our proposed method is effective and has potentially wide application.
利用加性高斯过程模型监测晶圆的几何质量
晶圆片的几何质量是半导体工业中一项重要的质量特征。然而,由于数据结构的复杂性所带来的挑战,在制造过程中很难监控这一特性。在本文中,我们提出了一个加性高斯过程(AGP)模型来近似晶圆片的标准几何轮廓,同时量化当制造过程处于控制状态时与标准的偏差。基于AGP模型,开发了两种统计检验来确定新生产的晶圆是否合格。我们进行了大量的数值模拟和实际案例研究,结果表明我们提出的方法是有效的,具有广泛的应用前景。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
IIE Transactions
IIE Transactions 工程技术-工程:工业
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4.5 months
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