Nanometer to Micron Scale Atomistic Mechanics of Silicon Using Atomistic Simulations at Accelerated Time Steps

Hansung Kim, V. Tomar
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引用次数: 2

Abstract

Atomistic simulations have a unique capability to reveal the material deformation mechanisms and the corresponding deformation-based constitutive behavior. However, atomistic simulations are limited by the accessible length and time scales. In the present work, an equivalent crystal lattice method is used to analyze atomistic mechanical deformation of nanometer- to micrometer-sized polycrystalline silicon (Si) samples at accelerated time steps. The equivalent crystal lattice method’s validity is verified by the results of classical molecular dynamics (MD) simulations at MD strain rates. The method is then used to predict material behavior at subcontinuum length scales. An extrapolation of the thin film polycrystalline silicon stress-strain relationships to lower strain-rate values indicates that the thin film peak stress values at the experimental strain rates are in agreement with experimental values. Analyses reveal that the peak stress values in the case of polycrystalline Si follow inverse Hall-Petch ...
用加速时间步长的原子模拟研究纳米到微米尺度硅的原子力学
原子模拟具有揭示材料变形机制和相应的基于变形的本构行为的独特能力。然而,原子模拟受到可访问的长度和时间尺度的限制。本文采用等效晶格法分析了纳米到微米尺寸多晶硅(Si)样品在加速时间步长的原子力学变形。等效晶格法的有效性通过经典分子动力学(MD)在MD应变速率下的模拟结果得到验证。该方法可用于预测亚连续体长度尺度下的材料行为。将多晶硅薄膜的应力-应变关系外推到较低应变率下,结果表明,在实验应变率下,薄膜的峰值应力值与实验值一致。分析表明,多晶硅的峰值应力值遵循相反的Hall-Petch…
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