ALD-ZnMgO and absorber surface modifications to substitute CdS buffer layers in co-evaporated CIGSe solar cells

IF 1.9 Q3 PHYSICS, APPLIED
R. Hertwig, S. Nishiwaki, M. Ochoa, Shih‐Chi Yang, T. Feurer, E. Gilshtein, A. Tiwari, R. Carron
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引用次数: 5

Abstract

High efficiency chalcopyrite thin film solar cells generally use chemical bath deposited CdS as buffer layer. The transition to Cd-free buffer layers, ideally by dry deposition methods is required to decrease Cd waste, enable all vacuum processing and circumvent optical parasitic absorption losses. In this study, Zn1−xMgxO thin films were deposited by atomic layer deposition (ALD) as buffer layers on co-evaporated Cu(In,Ga)Se2 (CIGS) absorbers. A specific composition range was identified for a suitable conduction band alignment with the absorber surface. We elucidate the critical role of the CIGS surface preparation prior to the dry ALD process. Wet chemical surface treatments with potassium cyanide, ammonium hydroxide and thiourea prior to buffer layer deposition improved the device performances. Additional in-situ surface reducing treatments conducted immediately prior to Zn1−xMgxO deposition improved device performance and reproducibility. Devices were characterised by (temperature dependant) current-voltage and quantum efficiency measurements with and without light soaking treatment. The highest efficiency was measured to be 18%.
ALD-ZnMgO和吸收剂表面改性替代共蒸发CIGSe太阳能电池中的CdS缓冲层
高效黄铜矿薄膜太阳能电池一般采用化学浴沉积的CdS作为缓冲层。理想情况下,通过干沉积方法过渡到无Cd缓冲层,以减少Cd浪费,实现所有真空处理并避免光寄生吸收损失。在本研究中,采用原子层沉积法(ALD)在共蒸发Cu(In,Ga)Se2 (CIGS)吸附剂上沉积了Zn1−xMgxO薄膜作为缓冲层。一个特定的组成范围确定了一个合适的传导带对准吸收器表面。我们阐明了干式ALD工艺前CIGS表面制备的关键作用。在缓冲层沉积之前,用氰化钾、氢氧化铵和硫脲进行湿化学表面处理,提高了器件的性能。在Zn1−xMgxO沉积之前立即进行了额外的原位表面还原处理,提高了器件的性能和再现性。器件的特点是(温度相关的)电流电压和量子效率测量有和没有光浸泡处理。测量到的最高效率为18%。
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来源期刊
EPJ Photovoltaics
EPJ Photovoltaics PHYSICS, APPLIED-
CiteScore
2.30
自引率
4.00%
发文量
15
审稿时长
8 weeks
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