{"title":"Effect of adsorbed layers on the anodic oxidation of simple organic compounds. Part 3.—Cu adsorption on Pt and its effect on the oxidation of HCOOH","authors":"A. H. Taylor, S. Kirkland, S. Brummer","doi":"10.1039/TF9716700809","DOIUrl":null,"url":null,"abstract":"The adsorption and desorption of Cu on a smooth Pt electrode from 1 M H2SO4 solutions which contain a range of Cu2+ concentrations has been studied as a function of potential. The effect of adsorbed Cu on the oxidation rate of HCOOH has been examined at + 0.60 V (RHE). Cu2+ adsorption is controlled largely by an activation process. The slow step in the process is apparently the discharge of Cu2+ at the electrode to Cu+. Desorption of a preadsorbed Cu layer (+0.40 V) is extremely rapid at potentials+ 0.70 V, where no Cu2+ adsorption is normally found. Analysis of the oxidation state of the adsorbing layer by charge and coverage measurements yields a value of 1.92 electrons/site. This indicates that the major part of the layer is Cuads attached to a single Pt surface site. The rate of adsorption of Cu2+ is decreased slightly in the presence of 0.1 M HCOOH. At low coverages (θCuads⩽0.19), a slight enhancement of the HCOOH oxidation rate is observed at +0.60 V. Above this coverage, the oxidation process is inhibited. Results are interpreted in terms of Cu2+ adsorption mechanisms on Pt and the effect of the adsorbed layer on the mechanisms of HCOOH electro-oxidation on Pt.","PeriodicalId":23290,"journal":{"name":"Transactions of The Faraday Society","volume":"67 1","pages":"809-818"},"PeriodicalIF":0.0000,"publicationDate":"1971-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1039/TF9716700809","citationCount":"14","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Transactions of The Faraday Society","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1039/TF9716700809","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 14
Abstract
The adsorption and desorption of Cu on a smooth Pt electrode from 1 M H2SO4 solutions which contain a range of Cu2+ concentrations has been studied as a function of potential. The effect of adsorbed Cu on the oxidation rate of HCOOH has been examined at + 0.60 V (RHE). Cu2+ adsorption is controlled largely by an activation process. The slow step in the process is apparently the discharge of Cu2+ at the electrode to Cu+. Desorption of a preadsorbed Cu layer (+0.40 V) is extremely rapid at potentials+ 0.70 V, where no Cu2+ adsorption is normally found. Analysis of the oxidation state of the adsorbing layer by charge and coverage measurements yields a value of 1.92 electrons/site. This indicates that the major part of the layer is Cuads attached to a single Pt surface site. The rate of adsorption of Cu2+ is decreased slightly in the presence of 0.1 M HCOOH. At low coverages (θCuads⩽0.19), a slight enhancement of the HCOOH oxidation rate is observed at +0.60 V. Above this coverage, the oxidation process is inhibited. Results are interpreted in terms of Cu2+ adsorption mechanisms on Pt and the effect of the adsorbed layer on the mechanisms of HCOOH electro-oxidation on Pt.
本文研究了不同Cu2+浓度的H2SO4溶液对Cu在光滑Pt电极上的吸附和解吸过程。在+ 0.60 V (RHE)下,考察了吸附Cu对HCOOH氧化速率的影响。Cu2+吸附主要受活化过程控制。该过程的缓慢步骤显然是电极处的Cu2+向Cu+放电。在+ 0.70 V电势下,预吸附Cu层(+0.40 V)的脱附速度非常快,通常没有Cu2+吸附。通过电荷和覆盖率测量对吸附层的氧化状态进行分析,得出1.92个电子/位点的值。这表明该层的主要部分是附着在单个Pt表面的cuad。在0.1 M HCOOH的存在下,对Cu2+的吸附速率略有下降。在低覆盖率(θCuads≥0.19)下,在+0.60 V下观察到HCOOH氧化速率略有增强。在此覆盖范围以上,氧化过程被抑制。结果解释了Cu2+在Pt上的吸附机理,以及吸附层对HCOOH电氧化Pt机理的影响。