{"title":"FinFETs: From Devices to Architectures","authors":"D. Bhattacharya, N. Jha","doi":"10.1017/CBO9781316156148.003","DOIUrl":null,"url":null,"abstract":"Since Moore’s law driven scaling of planar MOSFETs \nfaces formidable challenges in the nanometer regime, FinFETs and Trigate FETs have emerged as their successors. Owing \nto the presence of multiple (two/three) gates, FinFETs/Trigate \nFETs are able to tackle short-channel effects (SCEs) better than \nconventional planar MOSFETs at deeply scaled technology nodes \nand thus enable continued transistor scaling. In this paper, we \nreview research on FinFETs from the bottommost device level \nto the topmost architecture level. We survey different types of \nFinFETs, various possible FinFET asymmetries and their impact, \nand novel logic-level and architecture-level tradeoffs offered by \nFinFETs. We also review analysis and optimization tools that \nare available for characterizing FinFET devices, circuits, and \narchitectures.","PeriodicalId":7352,"journal":{"name":"Advances in Optoelectronics","volume":"2014 1","pages":"21-55"},"PeriodicalIF":0.0000,"publicationDate":"2014-09-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1017/CBO9781316156148.003","citationCount":"166","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Advances in Optoelectronics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1017/CBO9781316156148.003","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"Engineering","Score":null,"Total":0}
引用次数: 166
Abstract
Since Moore’s law driven scaling of planar MOSFETs
faces formidable challenges in the nanometer regime, FinFETs and Trigate FETs have emerged as their successors. Owing
to the presence of multiple (two/three) gates, FinFETs/Trigate
FETs are able to tackle short-channel effects (SCEs) better than
conventional planar MOSFETs at deeply scaled technology nodes
and thus enable continued transistor scaling. In this paper, we
review research on FinFETs from the bottommost device level
to the topmost architecture level. We survey different types of
FinFETs, various possible FinFET asymmetries and their impact,
and novel logic-level and architecture-level tradeoffs offered by
FinFETs. We also review analysis and optimization tools that
are available for characterizing FinFET devices, circuits, and
architectures.
期刊介绍:
Advances in OptoElectronics is a peer-reviewed, open access journal that publishes original research articles as well as review articles in all areas of optoelectronics.