FinFETs: From Devices to Architectures

Q3 Engineering
D. Bhattacharya, N. Jha
{"title":"FinFETs: From Devices to Architectures","authors":"D. Bhattacharya, N. Jha","doi":"10.1017/CBO9781316156148.003","DOIUrl":null,"url":null,"abstract":"Since Moore’s law driven scaling of planar MOSFETs \nfaces formidable challenges in the nanometer regime, FinFETs and Trigate FETs have emerged as their successors. Owing \nto the presence of multiple (two/three) gates, FinFETs/Trigate \nFETs are able to tackle short-channel effects (SCEs) better than \nconventional planar MOSFETs at deeply scaled technology nodes \nand thus enable continued transistor scaling. In this paper, we \nreview research on FinFETs from the bottommost device level \nto the topmost architecture level. We survey different types of \nFinFETs, various possible FinFET asymmetries and their impact, \nand novel logic-level and architecture-level tradeoffs offered by \nFinFETs. We also review analysis and optimization tools that \nare available for characterizing FinFET devices, circuits, and \narchitectures.","PeriodicalId":7352,"journal":{"name":"Advances in Optoelectronics","volume":"2014 1","pages":"21-55"},"PeriodicalIF":0.0000,"publicationDate":"2014-09-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1017/CBO9781316156148.003","citationCount":"166","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Advances in Optoelectronics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1017/CBO9781316156148.003","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"Engineering","Score":null,"Total":0}
引用次数: 166

Abstract

Since Moore’s law driven scaling of planar MOSFETs faces formidable challenges in the nanometer regime, FinFETs and Trigate FETs have emerged as their successors. Owing to the presence of multiple (two/three) gates, FinFETs/Trigate FETs are able to tackle short-channel effects (SCEs) better than conventional planar MOSFETs at deeply scaled technology nodes and thus enable continued transistor scaling. In this paper, we review research on FinFETs from the bottommost device level to the topmost architecture level. We survey different types of FinFETs, various possible FinFET asymmetries and their impact, and novel logic-level and architecture-level tradeoffs offered by FinFETs. We also review analysis and optimization tools that are available for characterizing FinFET devices, circuits, and architectures.
finfet:从器件到架构
由于摩尔定律驱动的平面mosfet的缩放在纳米领域面临着巨大的挑战,finfet和Trigate fet已经成为它们的继任者。由于存在多个(两个/三个)栅极,finfet /Trigate fet能够在深度缩放技术节点上比传统的平面mosfet更好地解决短通道效应(sce),从而实现持续的晶体管缩放。在本文中,我们回顾了finfet的研究,从最底层的器件级到最顶层的架构级。我们调查了不同类型的FinFET,各种可能的FinFET不对称及其影响,以及FinFET提供的新的逻辑级和架构级权衡。我们还回顾了可用于表征FinFET器件、电路和架构的分析和优化工具。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
Advances in Optoelectronics
Advances in Optoelectronics ENGINEERING, ELECTRICAL & ELECTRONIC-
CiteScore
1.30
自引率
0.00%
发文量
0
期刊介绍: Advances in OptoElectronics is a peer-reviewed, open access journal that publishes original research articles as well as review articles in all areas of optoelectronics.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信