On the use of a microwave linear accelerator for control of carrier lifetime in electronic silicon devices

L. Barberis, M. Icardi, M. Portesine, S. Tenconi, P.G. Di Marco, A. Martelli, P.G. Fouchi
{"title":"On the use of a microwave linear accelerator for control of carrier lifetime in electronic silicon devices","authors":"L. Barberis,&nbsp;M. Icardi,&nbsp;M. Portesine,&nbsp;S. Tenconi,&nbsp;P.G. Di Marco,&nbsp;A. Martelli,&nbsp;P.G. Fouchi","doi":"10.1016/0146-5724(85)90181-5","DOIUrl":null,"url":null,"abstract":"<div><p>The possibility of using a 12 MeV linear accelerator for control of minority carrier lifetime in silicon power rectifiers and thyristors to be used at high frequencies has been investigated. Electron irradiation of these devices has been used in place of metallic diffusion and <sup>60</sup>Co gamma irradiation. A comparison with the latter two techniques is made. The relation between absorbed dose and high and low injection lifetimes (τ<span>HL</span> and τ<span>LL</span>) has been studied for diodes and from the linear relationship <span><math><mtext>1</mtext><mtext>τ</mtext><mtext> = </mtext><mtext>1</mtext><mtext>τ</mtext><msub><mi></mi><mn>0</mn></msub><mtext> + KD</mtext></math></span> found, values for the damage constant have been calculated. The dependence of the stability of the electrical characteristics of the silicon devices after electron irradiation on the annealing process at 150, 200, and 360°C has been analyzed. The conclusions drawn from this study are that charge lifetime control in semiconductors is feasible by high energy electrons because electron irradiation provides the more precise, uniform, and reproducible method of lifetime control. In addition this technique is much better than the conventional metal diffusion or gamma irradiation in raising the quality and end-product rate of these devices.</p></div>","PeriodicalId":101054,"journal":{"name":"Radiation Physics and Chemistry (1977)","volume":"26 2","pages":"Pages 165-172"},"PeriodicalIF":0.0000,"publicationDate":"1985-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0146-5724(85)90181-5","citationCount":"5","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Radiation Physics and Chemistry (1977)","FirstCategoryId":"1085","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/0146572485901815","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 5

Abstract

The possibility of using a 12 MeV linear accelerator for control of minority carrier lifetime in silicon power rectifiers and thyristors to be used at high frequencies has been investigated. Electron irradiation of these devices has been used in place of metallic diffusion and 60Co gamma irradiation. A comparison with the latter two techniques is made. The relation between absorbed dose and high and low injection lifetimes (τHL and τLL) has been studied for diodes and from the linear relationship 1τ = 1τ0 + KD found, values for the damage constant have been calculated. The dependence of the stability of the electrical characteristics of the silicon devices after electron irradiation on the annealing process at 150, 200, and 360°C has been analyzed. The conclusions drawn from this study are that charge lifetime control in semiconductors is feasible by high energy electrons because electron irradiation provides the more precise, uniform, and reproducible method of lifetime control. In addition this technique is much better than the conventional metal diffusion or gamma irradiation in raising the quality and end-product rate of these devices.

微波直线加速器在电子硅器件载流子寿命控制中的应用
研究了用12mev直线加速器控制高频硅功率整流器和晶闸管中少数载流子寿命的可能性。这些装置的电子辐照已被用来代替金属扩散和60Co伽马辐照。并与后两种技术进行了比较。研究了二极管的吸收剂量与高注射寿命和低注射寿命(τHL和τLL)之间的关系,并根据所发现的线性关系1τ = 1τ0 + KD计算出了损伤常数的值。分析了电子辐照后硅器件电特性稳定性与150℃、200℃和360℃退火工艺的关系。本研究的结论是,利用高能电子控制半导体中的电荷寿命是可行的,因为电子辐照提供了更精确、均匀和可重复的寿命控制方法。此外,该技术在提高这些装置的质量和最终成品率方面比传统的金属扩散或伽马辐照要好得多。
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