{"title":"Wide range applications of process plasma diagnostics using vacuum ultraviolet absorption spectroscopy","authors":"K. Takeda, K. Ishikawa, M. Hori","doi":"10.1007/s41614-022-00075-3","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":74694,"journal":{"name":"Reviews of modern plasma physics","volume":"6 1","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2022-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Reviews of modern plasma physics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1007/s41614-022-00075-3","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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