Nitrogen-rich graphitic carbon nitride (g-C3N5): Emerging low-bandgap materials for photocatalysis

Hoai-Thanh Vuong, Duc-Viet Nguyen, Ly P. Phuong, Phan P. D. Minh, Bao N. Ho, Hoai A. Nguyen
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引用次数: 2

Abstract

The bottlenecks in photocatalytic materials primarily center on light absorption capacities and rapid charge recombination. Thus, many gigantic effects have been undertaken by worldwide scientists to address the issues. In this concept, carbon-based photocatalysts, such as graphene or graphitic carbon nitrides (g-C3N4), would frequently capture scientific fascination due to their distinct properties in catalytic applications. However, traditional materials would possess the drawbacks mentioned above. In the current era, nitrogen-rich graphitic carbon nitrides (g-C3N5) have emerged as a promising star for photocatalytic applications due to the significant enhancements in light absorption properties, which can activate in ultraviolet, visible, and even under near-infrared irradiations. This review will summarize the recent progress in the fabrication of g-C3N5 and the photocatalytic application of these based materials by thoroughly investigating current literature studies. Thus, updating the current trend in state-of-the-art materials would motivate researchers to explore the field further.

Abstract Image

富氮石墨氮化碳(g-C3N5):新兴的光催化低带隙材料
光催化材料的瓶颈主要集中在光吸收能力和快速电荷复合上。因此,世界各地的科学家已经采取了许多巨大的影响来解决这些问题。在这个概念中,碳基光催化剂,如石墨烯或石墨氮化碳(g-C3N4),由于其在催化应用中的独特性质,经常会引起科学界的兴趣。然而,传统材料将具有上述缺点。在当前时代,富含氮的石墨碳氮化物(g-C3N5)由于其光吸收性能的显著增强,已成为光催化应用的一颗有前途的明星,它可以在紫外线、可见光甚至近红外辐射下激活。本文将通过深入研究现有文献研究,总结g-C3N5的制备及其光催化应用的最新进展。因此,更新最先进材料的当前趋势将激励研究人员进一步探索该领域。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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