Microstructures and nanomechanical properties of nanolaminated Ta/Co composites and their strengthening mechanisms

Mohammad Nasim , Yuncang Li , Ming Wen , Cuie Wen
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Abstract

In this study, nanolaminated tantalum (Ta)/cobalt (Co) composites (NTCCs) with an individual layer thickness (h) ranging from 5 nm to 100 nm were fabricated via magnetron sputtering. The microstructures and nanomechanical properties of the NTCCs were affected by variation in h. The NTCCs showed nanograin structures in Ta and Co layers, with Ta and Co textures that were randomly oriented. Nanohardness (H) and corresponding yield strength, σys=H/2.7, of the NTCCs gradually increased from 5.75 ± 0.15 GPa to 7.20 ± 0.13 GPa and from 2.12 ± 0.06 GPa to 2.67 ± 0.05 GPa, respectively, with reducing h from 100 nm to 5 nm. NTCC showed an extraordinarily high yield strength (∼ 2.67 GPa) at h = 5 nm due to its reduced individual layer thickness and non-defective microstructures, which is well above the maximum yield strength of studied nanolaminated materials (comprised of at least one hcp constituent), to date. The creep depth of 5 nm NTCC was lower than that of the 100 nm NTCC, and the creep deformation of 5 nm NTCC is related to the bending, breaking, and intermixing of Ta and Co layers, whereas the 100 nm NTCC exhibited bending and thinning of Ta and Co layers with more deformation. Strain rate sensitivity (m) of NTCC increased from 0.0666 to 0.2076 with increasing h from 5 nm to 100 nm. The Hall–Petch and Confined Layer Slip strengthening mechanisms governed the strength of the NTCCs for h = 25–100 nm and h = 10 nm, respectively. It is worth noting that the 5 nm NTCC did not follow any of the strengthening mechanisms and became independent of h; rather, the strength at this length scale was greatly influenced by grains, layer thickness, and microstructural variations at the interfaces. The increased σys and E at h = 5 nm may facilitate tailoring the mechanical properties of NTCCs with high strength and ductility.

纳米层合Ta/Co复合材料的微观组织、纳米力学性能及其强化机理
在本研究中,通过磁控溅射制备了单层厚度(h)在5nm至100nm之间的纳米钽(Ta)/钴(Co)复合材料(NTCC)。NTCC的微观结构和纳米力学性能受到h变化的影响。NTCC在Ta和Co层中显示出纳米颗粒结构,Ta和Co织构是随机取向的。NTCC的纳米硬度(H)和相应的屈服强度σys=H/2.7从5.75逐渐增加 ± 0.15 GPa至7.20 ± 0.13 GPa和2.12 ± 0.06 GPa至2.67 ± 0.05 GPa,h从100减少 nm至5 nm。NTCC表现出极高的屈服强度(~ 2.67 GPa)在h = 5. 纳米,这是由于其减少的单个层厚度和无缺陷的微观结构,远高于迄今为止所研究的纳米层压材料(由至少一种hcp成分组成)的最大屈服强度。蠕变深度为5 nm NTCC低于100 纳米NTCC和5 纳米NTCC与Ta和Co层的弯曲、断裂和混合有关,而100 nm的NTCC表现出Ta和Co层的弯曲和减薄,并且具有更多的变形。NTCC的应变率灵敏度(m)从0.0666增加到0.2076,随h从5增加 nm至100 nm。霍尔-佩奇和约束层滑移强化机制控制了NTCC的强度h = 25–100 nm和h = 10 nm。值得注意的是 nm NTCC不遵循任何强化机制,变得独立于h;相反,这种长度尺度下的强度在很大程度上受到晶粒、层厚度和界面微观结构变化的影响。h处增加的σys和E = 5. nm可以有助于定制具有高强度和延展性的NTCC的机械性能。
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