DC pulsed plasma magnetron sputtering of CdO/Cu/CdO multilayers thin films for self-cleaning and optoelectronic applications

IF 1.9 4区物理与天体物理 Q3 OPTICS

Journal of the European Optical Society-Rapid Publications Pub Date : 2023-03-03 DOI:10.1051/jeos/2023009

Alzahra A. Abd El-Moula, M. Raaif, F. El-Hossary, Mohamed Abo El-Kassem

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引用次数: 2

Abstract

In this study, CdO/Cu/CdO multilayers thin films were organized on glass substrates with different Cu intermetallic layer thickness engaging DC plasma magnetron sputtering. The optoelectronic properties and structural characteristics of the multilayers at various Cu intermetallic layer thicknesses which were varied from 4 to 16 nm were explored. The calculated band gap was reduced from 2.66 eV to 2.48 eV as the Cu intermetallic layer thickness increased from 4 to 16 nm. The refractive index and coefficient of extinction of CdO/Cu/CdO multilayers increased with increasing the Cu intermetallic layer thickness. The resistivity is reduced from 1.8×10−2 Ω.cm for CdO single layer to reach a value of 2.7×10−4 Ω.cm for CdO/Cu (16nm)/CdO multilayer. Further, the sheet resistance is decreased from 1000 to 13.8 /sq with the variation in Cu intermetallic layer thickness from 0 to 16 nm. CdO/Cu (4 nm)/CdO multilayer film recorded the best figure of merit (2.3x10-4 Ω−1). After sunlight illumination for the multilayers, the surface wettability was improved and the contact angle recorded lowest value of nearly 24 for CdO/Cu (8nm)/CdO and CdO/Cu (12nm)/CdO.

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用于自清洁和光电应用的CdO/Cu/CdO多层薄膜的直流脉冲等离子体磁控溅射

本研究采用直流等离子体磁控溅射技术，在不同Cu金属间层厚度的玻璃衬底上制备了CdO/Cu/CdO多层薄膜。研究了在4至16nm的不同Cu金属间层厚度下多层膜的光电性能和结构特征。随着Cu金属间层厚度从4nm增加到16nm，计算的带隙从2.66eV减小到2.48eV。CdO/Cu/CdO多层膜的折射率和消光系数随着Cu金属间层厚度的增加而增加。CdO单层的电阻率从1.8×10−2Ω.cm降低到CdO/Cu（16nm）/CdO多层的2.7×10−4Ω.cm。此外，薄层电阻从1000降低到13.8/sq随Cu金属间化合物层厚度从0到16nm的变化而变化。CdO/Cu（4 nm）/CdO多层膜记录了最佳品质因数（2.3x10-4Ω−1）。多层膜在阳光照射后，表面润湿性得到改善，接触角最低，接近24 对于CdO/Cu（8nm）/CdO和CdO/Cu。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Journal of the European Optical Society-Rapid Publications 物理-光学

CiteScore

2.40

自引率

0.00%

发文量

审稿时长

5 weeks

期刊介绍： Rapid progress in optics and photonics has broadened its application enormously into many branches, including information and communication technology, security, sensing, bio- and medical sciences, healthcare and chemistry. Recent achievements in other sciences have allowed continual discovery of new natural mysteries and formulation of challenging goals for optics that require further development of modern concepts and running fundamental research. The Journal of the European Optical Society – Rapid Publications (JEOS:RP) aims to tackle all of the aforementioned points in the form of prompt, scientific, high-quality communications that report on the latest findings. It presents emerging technologies and outlining strategic goals in optics and photonics. The journal covers both fundamental and applied topics, including but not limited to: Classical and quantum optics Light/matter interaction Optical communication Micro- and nanooptics Nonlinear optical phenomena Optical materials Optical metrology Optical spectroscopy Colour research Nano and metamaterials Modern photonics technology Optical engineering, design and instrumentation Optical applications in bio-physics and medicine Interdisciplinary fields using photonics, such as in energy, climate change and cultural heritage The journal aims to provide readers with recent and important achievements in optics/photonics and, as its name suggests, it strives for the shortest possible publication time.