Optical lithography

Abstract

Optical lithography’s ubiquitous use is a direct result of its highly parallel nature allowing vast amounts of information (i.e. patterns) to be transferred in a very short time. For example, considering the specification of a modern leading edge scanner (150 300-mm wafers per hour and 40-nm two-dimensional pattern resolution), the pixel throughput can be found to be approximately 1.8T pixels per second. This capability has arguably enabled the computing revolution we have undergone over the past 50 years.