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Characteristics of the pressure profile in the accelerator on the RF negative ion source at ASIPP

IF 3.5 3区 工程技术 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY
Nami Jishu yu Jingmi Gongcheng/Nanotechnology and Precision Engineering Pub Date : 2023-06-21 DOI:10.1063/10.0019383
Mingshan Wu, Luxiang Xu, Zhou Yanbo, L. Liang, Yelong Zheng
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ASIPP射频负离子源加速器压力分布特征
本文章由计算机程序翻译，如有差异，请以英文原文为准。
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来源期刊
Nami Jishu yu Jingmi Gongcheng/Nanotechnology and Precision Engineering
Nami Jishu yu Jingmi Gongcheng/Nanotechnology and Precision Engineering Engineering-Industrial and Manufacturing Engineering
CiteScore
6.50
自引率
0.00%
发文量
1379
审稿时长
14 weeks
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