17‐3: An 8.3‐inch 1058‐ppi OLED Display with Side‐by‐Side Pixel Structure Fully Fabricated by Photolithography

S. Eguchi, Takayuki Oide, Sho Kato, A. Chida, Koji Kusunoki, Yasutaka Nakazawa, Satoru Idojiri, K. Okazaki, S. Yamazaki
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Abstract

We developed a patterning technology via photolithography that does not use a fine metal mask to achieve high resolution for all RGB pixels. An 8.3‐inch 1058‐ppi organic light‐ emitting diode (OLED) display was prototyped using the technology for an oxide semiconductor backplane over a glass substrate. Having no restriction on alignment accuracy, metal mask washing, running costs, etc. in the manufacturing process of medium‐ or large‐sized OLED displays, this technology holds promise for enabling the mass production.
17‐3:一个8.3英寸1058 ppi的OLED显示器,具有完全由光刻技术制造的并排像素结构
我们通过光刻技术开发了一种图案化技术,该技术不使用精细的金属掩模来实现所有RGB像素的高分辨率。使用玻璃基板上的氧化物半导体背板技术,对8.3英寸1058-ppi有机发光二极管(OLED)显示器进行了原型设计。在中大型OLED显示器的制造过程中,该技术对对准精度、金属掩模清洗、运行成本等没有限制,有望实现大规模生产。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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