Infrared and Terahertz Spectra of Sn-Doped Vanadium Dioxide Films

IF 2.7 Q1 MATERIALS SCIENCE, CERAMICS
A. Grebenchukov, O. Boytsova, A. Shakhmin, A. Tatarenko, O. Makarevich, I. Roslyakov, G. Kropotov, M. Khodzitsky
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引用次数: 0

Abstract

This work reports the effect of tin (Sn) doping on the infrared (IR) and terahertz (THz) properties of vanadium dioxide (VO2) films. The films were grown by hydrothermal synthesis with a post-annealing process and then fully characterized by X-ray diffraction (XRD), Raman spectroscopy, scanning electron microscopy (SEM), and temperature-controlled electrical resistivity as well as IR and THz spectroscopy techniques. Utilizing (NH4)2SnF6 as a Sn precursor allows the preparation of homogeneous Sn-doped VO2 films. Doping of VO2 films with Sn led to an increase in the thermal hysteresis width while conserving the high modulation depth in the mid-IR regime, which would be beneficial for the applications of VO2 films in IR memory devices. A further analysis shows that Sn doping of VO2 films significantly affects the temperature-dependent THz optical properties, in particular leading to the suppression of the temperature-driven THz transmission modulation. These results indicate Sn-doped VO2 films as a promising material for the development of switchable IR/THz dichroic components.
掺锡二氧化钒薄膜的红外和太赫兹光谱
本文报道了锡(Sn)掺杂对二氧化钒(VO2)薄膜红外(IR)和太赫兹(THz)性能的影响。采用水热法和后退火法制备薄膜,并利用x射线衍射(XRD)、拉曼光谱(Raman spectroscopy)、扫描电镜(SEM)、温控电阻率、红外光谱(IR)和太赫兹光谱(THz)等技术对薄膜进行了表征。利用(NH4)2SnF6作为Sn前驱体可以制备均匀的掺锡VO2薄膜。VO2薄膜中Sn的掺杂增加了其热滞后宽度,同时保持了中红外区较高的调制深度,这将有利于VO2薄膜在红外存储器件中的应用。进一步分析表明,VO2薄膜的Sn掺杂显著影响了温度相关的太赫兹光学特性,特别是抑制了温度驱动的太赫兹传输调制。这些结果表明,锡掺杂VO2薄膜是开发可切换IR/THz二色性元件的有前途的材料。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
CiteScore
3.00
自引率
7.10%
发文量
66
审稿时长
10 weeks
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