{"title":"Pitting Corrosion and Mechanical Properties of Direct Current and Pulsed Reverse Current Electrodeposited Nickel-Tungsten Coatings","authors":"M. Dadvand, O. Savadogo","doi":"10.14447/jnmes.v25i2.a06","DOIUrl":null,"url":null,"abstract":"The electrochemical corrosion and mechanical properties of direct current and pulsed reverse current electrodeposited nickel and nickel-tungsten were investigated by using cyclic polarization measurement and nano-indentation techniques. Direct and pulsed reverse current electrodeposited nickel-tungsten coatings revealed a significant higher resistance to pitting corrosion when compared to direct and pulsed reverse current deposited nickel. Furthermore, pulsed reverse current electrodeposited nickel-tungsten displayed the most noble corrosion potential and higher corrosion resistance compared to direct current electrodeposited nickel-tungsten. This was attributed to the more nano- crystalline structure of the pulsed-reverse current deposited coatings when compared to that of the direct current electrodeposited nickel-tungsten. The average modulus for both direct and pulsed reverse current deposited nickel-tungsten were found to be similar but the average hardness of direct current deposited nickel-tungsten was slightly higher than that of pulsed reverse current deposited nickel-tungsten. This was attributed to the higher tungsten content (35 wt.%) in the direct current deposited nickel-tungsten coating compared to that (25 wt.%) in the pulsed reverse current deposited nickel-tungsten and is supported by our energy dispersive X-ray spectroscopy results.","PeriodicalId":16447,"journal":{"name":"Journal of New Materials For Electrochemical Systems","volume":null,"pages":null},"PeriodicalIF":0.7000,"publicationDate":"2022-06-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of New Materials For Electrochemical Systems","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.14447/jnmes.v25i2.a06","RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"ELECTROCHEMISTRY","Score":null,"Total":0}
引用次数: 0
Abstract
The electrochemical corrosion and mechanical properties of direct current and pulsed reverse current electrodeposited nickel and nickel-tungsten were investigated by using cyclic polarization measurement and nano-indentation techniques. Direct and pulsed reverse current electrodeposited nickel-tungsten coatings revealed a significant higher resistance to pitting corrosion when compared to direct and pulsed reverse current deposited nickel. Furthermore, pulsed reverse current electrodeposited nickel-tungsten displayed the most noble corrosion potential and higher corrosion resistance compared to direct current electrodeposited nickel-tungsten. This was attributed to the more nano- crystalline structure of the pulsed-reverse current deposited coatings when compared to that of the direct current electrodeposited nickel-tungsten. The average modulus for both direct and pulsed reverse current deposited nickel-tungsten were found to be similar but the average hardness of direct current deposited nickel-tungsten was slightly higher than that of pulsed reverse current deposited nickel-tungsten. This was attributed to the higher tungsten content (35 wt.%) in the direct current deposited nickel-tungsten coating compared to that (25 wt.%) in the pulsed reverse current deposited nickel-tungsten and is supported by our energy dispersive X-ray spectroscopy results.
期刊介绍:
This international Journal is intended for the publication of original work, both analytical and experimental, and of reviews and commercial aspects related to the field of New Materials for Electrochemical Systems. The emphasis will be on research both of a fundamental and an applied nature in various aspects of the development of new materials in electrochemical systems.