Electrodeposition process of perrhenate ions from KNO3 and Na2SO4 background electrolytes in the presence of citric acid

IF 0.3 Q4 CHEMISTRY, MULTIDISCIPLINARY
N.Zh. Zhumasheva, Leyla Kudreeva, A. Kalyyeva, G. Badavamova
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Abstract

Processes involved in the electrodeposition of perrhenate ions were studied from two different potassium nitrate and sodium sulfate background electrolytes in the presence of citric acid on graphite electrode by cyclic voltammetry method. Anodic and cathodic potentials of deposited film were determined. After electrolysis process, morphology and content of obtained deposited layers were investigated by SEM and X-Ray methods. The coated film from sodium sulfate background electrolyte was not uniform and Re content was 60.83-65.5%, in case of potassium nitrate electrolyte, the deposited film was more densely located, and Re content was 80.94-82.52%. In the presence of nickel sulfate and citric acid, an alloy was formed with content of Re 80.94-82.52%, 14.10-11.83% of Ni, 4.96-5.66% of impurities, which were confirmed by X-Ray method. The current density decreased with addition of citric acid into sodium sulfate background electrolyte and in cathodic area, the reduction potential of perrhenate ions remained the same, but oxidation potentials changed from 0.25 to 0.35 V and from 0.5 to 0.6 V. The influence of citric acid on potentials of the processes of reduction and oxidation of perrhenate ions from potassium nitrate gave following results: reduction peaks shifted from -0.35 to -0.55 V, and multi peaks of oxidation appeared which were not noticeable without citric acid. It was shown that citric acid has inhibitory effect on reduction and oxidation of perrhenate ions. It is shown that the electrochemical reduction of perrhenate ions leads to the formation of rhenium dioxide in different forms.
柠檬酸存在下,KNO3和Na2SO4背景电解液中高透酸盐离子的电沉积过程
采用循环伏安法研究了在柠檬酸存在下,以两种不同的硝酸钾和硫酸钠为背景电解质在石墨电极上电沉积高铼酸盐离子的过程。测定了沉积膜的阳极电位和阴极电位。采用扫描电镜(SEM)和X射线(X-Ray)方法对电解后沉积层的形貌和含量进行了研究。硫酸钠背景电解质的镀膜不均匀,Re含量为60.83-65.5%,在硝酸钾电解质的情况下,沉积膜的位置更密集,Re含量达到80.94-82.52%。在硫酸镍和柠檬酸的存在下,形成了Re含量为80.94-82.5 2%、Ni含量为14.10-11.83%、杂质含量为4.96-5.66%的合金,经X射线方法证实。电流密度随着硫酸钠背景电解质中柠檬酸的加入而降低,在阴极区域,高铼酸根离子的还原电位保持不变,但氧化电位从0.25变为0.35 V和0.5至0.6 V.柠檬酸对硝酸钾还原和氧化高铼酸根离子过程电位的影响结果如下:还原峰从-0.35移动到-0.55 V、 并且出现了在没有柠檬酸的情况下不明显的多个氧化峰。结果表明,柠檬酸对高铼酸根离子的还原和氧化有抑制作用。研究表明,高铼酸根离子的电化学还原导致不同形式的二氧化铼的形成。
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17
审稿时长
10 weeks
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