Low temperature processed, highly stable CMOS inverter by integrating Zn-ON and tellurium thin-film transistors

IF 3.7 3区 工程技术 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY
M. Naqi, S. Jang, Y. Cho, Ji Min Park, Joo on Oh, Hyun Yeol Rho, Hyunsook Kim, Sunkook Kim
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引用次数: 1

Abstract

Semiconductors processed at low temperature for complementary metal–oxide semiconductors (CMOS) devices are receiving considerable attention in the field of integrated electronic applications. In this work, we demonstrated a CMOS inverter constructed by n-type ZnON and p-type Te TFTs where all the processes have been done at low temperature. The electrical measurements of proposed TFTs exhibit high mobility (> 100 and > 3 cm2/Vs in case of ZnON and Te TFTs, respectively) and a stable on/off current ratio. The resulted CMOS inverter exhibits a high voltage swing and a high voltage gain of 15.89. Since all the synthesis and fabrication processes are performed at low temperatures with easy processing techniques, the results may open new opportunities in the field of integrated electronics field.
低温加工,高稳定的CMOS逆变器集成锌- on和碲薄膜晶体管
互补金属氧化物半导体(CMOS)器件的低温加工在集成电子应用领域受到广泛关注。在这项工作中,我们展示了一个由n型ZnON和p型tft构成的CMOS逆变器,其中所有的工艺都是在低温下完成的。所提出的tft的电学测量显示出高迁移率(ZnON和Te tft分别为>00和bbb3cm2 /Vs)和稳定的通/关电流比。所得到的CMOS逆变器具有高电压摆幅和15.89的高电压增益。由于所有的合成和制造过程都是在低温下进行的,并且加工技术简单,因此这一结果可能在集成电子领域开辟新的机会。
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来源期刊
Journal of Information Display
Journal of Information Display MATERIALS SCIENCE, MULTIDISCIPLINARY-
CiteScore
7.10
自引率
5.40%
发文量
27
审稿时长
30 weeks
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