Structural-phase states and micromechanical properties of nanostructured TiAlCuN coatings

IF 0.1 Q4 MULTIDISCIPLINARY SCIENCES
S. Konstantinov, F. Komarov, I. V. Chizhov, V. A. Zaikov
{"title":"Structural-phase states and micromechanical properties of nanostructured TiAlCuN coatings","authors":"S. Konstantinov, F. Komarov, I. V. Chizhov, V. A. Zaikov","doi":"10.29235/1561-8323-2023-67-2-101-110","DOIUrl":null,"url":null,"abstract":"TiAlCuN coatings were deposited by reactive magnetron sputtering on substrates of single-crystal silicon, and Titanium Grade2 wafers. To control and manage the coating deposition process by reactive magnetron sputtering, a previously developed modular gas flow control complex (MGFCC) was used. The elemental composition was studied by energy-dispersive X-ray spectroscopy (EDX). The structural-phase state of coatings was examined by X-ray diffraction (XRD) and scanning electron microscopy (SEM). Mechanical properties, such as hardness and Young’s modulus, were investigated by the nanoindentation using a CSM Instruments Nanohardness Tester NHT2 (Switzerland). The influence of deposition parameters such as: Ti and Al content, reactivity degree α, and nitride concentration on structure and mechanical properties was considered. It was found that a decrease in the reactivity degree α from 0.605 to 0.474 leads to a 23 % increase in the deposition rate of TiAlCuN coating. It was detected that adding Cu to the coating content decreases the mean sizes of crystallites and growth columns in comparison with the TiAlN analogues due to its segregation along crystalline boundaries and thus advances better mechanical characteristics. The hardness of TiAlCuN coatings varies in the range of H = 29.3–35.4 GPa, Young’s modulus E = 235.9–267.6 GPa. The impact strength index as the H / E∗ ratio and the plastic deformation resistance index H3 / E∗2 were calculated. The formed nitride coatings are suitable for use in space technologies.","PeriodicalId":41825,"journal":{"name":"DOKLADY NATSIONALNOI AKADEMII NAUK BELARUSI","volume":null,"pages":null},"PeriodicalIF":0.1000,"publicationDate":"2023-05-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"DOKLADY NATSIONALNOI AKADEMII NAUK BELARUSI","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.29235/1561-8323-2023-67-2-101-110","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"MULTIDISCIPLINARY SCIENCES","Score":null,"Total":0}
引用次数: 1

Abstract

TiAlCuN coatings were deposited by reactive magnetron sputtering on substrates of single-crystal silicon, and Titanium Grade2 wafers. To control and manage the coating deposition process by reactive magnetron sputtering, a previously developed modular gas flow control complex (MGFCC) was used. The elemental composition was studied by energy-dispersive X-ray spectroscopy (EDX). The structural-phase state of coatings was examined by X-ray diffraction (XRD) and scanning electron microscopy (SEM). Mechanical properties, such as hardness and Young’s modulus, were investigated by the nanoindentation using a CSM Instruments Nanohardness Tester NHT2 (Switzerland). The influence of deposition parameters such as: Ti and Al content, reactivity degree α, and nitride concentration on structure and mechanical properties was considered. It was found that a decrease in the reactivity degree α from 0.605 to 0.474 leads to a 23 % increase in the deposition rate of TiAlCuN coating. It was detected that adding Cu to the coating content decreases the mean sizes of crystallites and growth columns in comparison with the TiAlN analogues due to its segregation along crystalline boundaries and thus advances better mechanical characteristics. The hardness of TiAlCuN coatings varies in the range of H = 29.3–35.4 GPa, Young’s modulus E = 235.9–267.6 GPa. The impact strength index as the H / E∗ ratio and the plastic deformation resistance index H3 / E∗2 were calculated. The formed nitride coatings are suitable for use in space technologies.
纳米TiAlCuN涂层的结构相态和微观力学性能
采用反应磁控溅射法在单晶硅和2级钛基片上沉积了TiAlCuN涂层。为了控制和管理反应磁控溅射的涂层沉积过程,使用了先前开发的模块化气流控制复合体(MGFCC)。用能谱仪(EDX)对其元素组成进行了研究。通过X射线衍射(XRD)和扫描电子显微镜(SEM)对涂层的结构相态进行了检测。机械性能,如硬度和杨氏模量,通过使用CSM仪器纳米硬度测试仪NHT2(瑞士)的纳米压痕进行研究。考虑了Ti和Al含量、反应度α和氮化物浓度等沉积参数对结构和力学性能的影响。研究发现,反应度α从0.605降低到0.474导致TiAlCuN涂层的沉积速率增加23%。检测到,与TiAlN类似物相比,向涂层含量中添加Cu降低了晶粒和生长柱的平均尺寸,这是由于其沿结晶边界的偏析,从而提高了更好的机械特性。TiAlCuN涂层的硬度变化范围为H=29.3–35.4 GPa,杨氏模量E=235.9–267.6 GPa。计算了作为H/E*比的冲击强度指数和塑性变形阻力指数H3/E*2。所形成的氮化物涂层适用于空间技术。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
DOKLADY NATSIONALNOI AKADEMII NAUK BELARUSI
DOKLADY NATSIONALNOI AKADEMII NAUK BELARUSI MULTIDISCIPLINARY SCIENCES-
自引率
0.00%
发文量
69
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信