Effect of (Al, Zn, Cu, and Sr) doping on structural, optical and electrical properties of sprayed SnO2 thin films

IF 1.1 Q3 METALLURGY & METALLURGICAL ENGINEERING
Imene Saoula, Chahinez Siad, Khedidja Djedidi, N. Allag, A. Chala
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引用次数: 0

Abstract

Tin dioxide thin films deposited onto a glass substrate were prepared by spray pyrolysis technique, and then doped with different elements which are: Al, Zn, Cu, and Sr by electroplating method, these elements were chosen for their different atomic radii. XRD illustrate that all the films were polycrystalline with a tetragonal rutile structure and a strong preferred orientation of (200) plane. Uv-vis spectrophotometer specters showed that the highest average transmittance of Al/SnO2 film was about 86.77% in the visible region and the Sr/SnO2 film had the highest band gap of 3.95 eV. From the MEB images, the morphological characteristics improved when the SnO2 thin films doped with Al and Zn but the opposite happened when it doped with Cu and Sr. The four-point probe showed that the best sample was for Al/SnO2 because it had the highest electrical conductivity around 692.306 (Ω.cm) -1.
(Al, Zn, Cu, Sr)掺杂对喷涂SnO2薄膜结构、光学和电学性能的影响
采用喷雾热解技术在玻璃基板上制备了二氧化锡薄膜,并根据不同的原子半径选择不同的Al、Zn、Cu和Sr元素进行电镀。XRD分析结果表明,所有薄膜均为多晶,具有四边形金红石结构,具有较强的(200)面择优取向。紫外-可见分光光度计光谱显示,Al/SnO2薄膜在可见光区的平均透过率最高,约为86.77%,Sr/SnO2薄膜的带隙最高,为3.95 eV。从MEB图像来看,掺杂Al和Zn的SnO2薄膜的形貌特征得到改善,而掺杂Cu和sr的SnO2薄膜的形貌特征则相反。四点式探针表明,Al/SnO2薄膜的电导率最高,约为692.306 (Ω.cm) -1。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Acta Metallurgica Slovaca
Acta Metallurgica Slovaca METALLURGY & METALLURGICAL ENGINEERING-
CiteScore
2.00
自引率
30.00%
发文量
22
审稿时长
12 weeks
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