Surface microporous formation on AISI 4140 using combination of diffusion treatment after nitriding gas in muffle reactor

IF 1 4区 工程技术 Q4 ENGINEERING, MECHANICAL
K. Widi, W. Sujana, T. Rahardjo
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引用次数: 1

Abstract

Steel with microporous formation on surface layers is very important as self-lubricant and damping material. In this new method, AISI 4140 steel was subjected in two step combination treatment. First step is boost nitriding gas in fluidised bed reactor for 4 hours at 550°C and the second step is diffusion nitriding gas for 2 h at 550°C in muffle reactors. The diffusion without protective gas where air was present was applied after nitriding treatment in muffle reactors to release excess nitrogen which leads to microporous formation. This mechanism significantly increases surface porosity. The microporous formation at e layer during diffusion at nitriding process is controlled by reaction formation of N2, NO, Cr2O3 and Fe2O3 which depends on the atmosphere condition in the muffle reactor. The dynamics of atoms during these formations create tensile and compressive stress in the grain boundary that increases porosity formation.
马弗反应器渗氮后复合扩散处理在AISI 4140表面形成微孔
钢在表层形成微孔是一种重要的自润滑和阻尼材料。采用该方法对AISI 4140钢进行了两步组合处理。第一步是在550℃的流化床反应器中升压氮化气体4小时,第二步是在550℃的马弗反应器中扩散氮化气体2小时。在马弗反应器中进行氮化处理后,在空气存在的情况下进行无保护气体的扩散,释放过量的氮,导致微孔的形成。这一机制显著增加了表面孔隙率。氮化扩散过程中e层微孔的形成受N2、NO、Cr2O3和Fe2O3的反应控制,这取决于马弗反应器的气氛条件。在这些形成过程中,原子的动力学在晶界产生拉伸和压缩应力,从而增加孔隙度的形成。
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来源期刊
CiteScore
1.60
自引率
25.00%
发文量
21
审稿时长
>12 weeks
期刊介绍: IJSurfSE publishes refereed quality papers in the broad field of surface science and engineering including tribology, but with a special emphasis on the research and development in friction, wear, coatings and surface modification processes such as surface treatment, cladding, machining, polishing and grinding, across multiple scales from nanoscopic to macroscopic dimensions. High-integrity and high-performance surfaces of components have become a central research area in the professional community whose aim is to develop highly reliable ultra-precision devices.
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