SILICON SURFACE PATTERNING BY GLOW DISCHARGE PLASMA

Abstract

The possibility of changing the silicon surface morphology at certain glow discharge parameters is shown. It is established that oxidation is the main process influencing the surface morphology during glow discharge plasma treatment. As a result of processing in the investigated parameter range, various stages of the surface oxidation process are observed: the formation of a uniform oxide layer and the formation of nano- and microstructures of silicon oxide. It is shown that these processes lead to surface modification, which acquires stable hydrophilic and superhydrophilic properties.