Direct Process to Prepare Crystallized Freestanding Membranes of Hydroxyapatite Using Sacrificial Layer of Barium-Compounds

H. Nishikawa, T. Nishii
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Abstract

Freestanding membrane (FSM) of hydroxyapatite (HA) is a thin sheet of pure HA without any supporting substrates. Our original preparation process of FSM of HA had three steps: The first was the deposition of HA layer on sacrificial layer of solvent-soluble materials, the second was separation of FSM of HA by means of dissolution of sacrificial layer, and the third was post-annealing to crystallize FSM of HA. To date, the post-annealing process was a serious bottleneck of productivity owing to its too long time. In this short report, we proposed a novel sacrificial layer, heatproof and water-soluble Ba-compound, which makes the direct deposition of crystallized HA possible due to its heatproof property because the problem on the original process was that the previous sacrificial layers have no heatproof property and HA layer should be deposited as amorphous. We can deposit the Ba-compound sacrificial layer only in 1 hour followed with the direct deposition of crystallized HA layer, substituting the 20 hours of post-annealing. The FSM of HA was separated successfully from the substrate by means of dissolution of Ba-compound with water. Our novel process can shrink the process time by 19 hours.
用钡化合物的牺牲层直接制备羟基磷灰石晶体独立膜
羟基磷灰石(HA)的自立膜(FSM)是一种没有任何支撑基质的纯HA薄片。我们最初的HA FSM制备工艺有三个步骤:第一步是在溶剂可溶性材料的牺牲层上沉积HA层,第二步是通过溶解牺牲层来分离HA的FSM,第三步是后退火以结晶HA的FSM。到目前为止,后退火工艺由于时间过长而成为生产力的严重瓶颈。在这份简短的报告中,我们提出了一种新型的牺牲层,耐热且水溶性的Ba化合物,由于其耐热性,结晶HA的直接沉积成为可能,因为原始工艺的问题是以前的牺牲层没有耐热性,HA层应该沉积为非晶。我们可以在1小时内沉积Ba化合物牺牲层,然后直接沉积结晶的HA层,代替20小时的后退火。通过Ba化合物与水的溶解,成功地从基质中分离出HA的FSM。我们的新工艺可以将工艺时间缩短19小时。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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