P‐121: Evidence for the formation of localized charge traps during OLED degradation

Stefano Sem, S. Jenatsch, S. Züfle, W. Brütting, B. Ruhstaller
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Abstract

In this study we investigate the details of the degradation processes occurring in a specific TADF OLED stack. The devices are stressed with constant current. In order to gain understanding in the underlying degradation mechanisms, a series of experimental techniques are performed during stressing interruption. To complement the measurements, electrical device simulations are used to model the OLEDs and identify the degradation causes. Specifically, it is found that the generation of trap states at an interface causes a variation of the charge injection and accumulation inside the device.
P‐121:OLED降解过程中局部电荷阱形成的证据
在这项研究中,我们研究了在特定的TADF OLED堆栈中发生的降解过程的细节。这些装置受到恒流的压力。为了了解潜在的退化机制,在应力中断过程中进行了一系列的实验技术。为了补充测量,电气设备模拟用于对oled进行建模并确定退化原因。具体来说,发现在界面处产生的陷阱态会引起器件内部电荷注入和积累的变化。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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